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High-efficiency and stable quantum dot light-emitting diodes with staircase V2O5/PEDOT:PSS hole injection layer interface barrier
Organic Electronics ( IF 2.7 ) Pub Date : 2019-12-10 , DOI: 10.1016/j.orgel.2019.105589
Xiaohong Jiang , Yuting Ma , Yu Tian , Anzhen Wang , Aqiang Wang , Shuangshuang Zhang , Shujie Wang , Zuliang Du

The main bottleneck causing lags in the application of transition metal oxides as substitutes for poly (3,4-ethylenedioxythiophene):poly (styrene-sulfonate) (PEDOT:PSS) are the relatively low level efficiencies of quantum dot light-emitting diodes (QLEDs), even though they can improve a device's stability. High-performance QLEDs are fabricated with long lifetimes using low-cost, reliable and all-solution-processed hole injection materials with a double hole injection layer (HIL) structure. Vanadium oxide (V2O5)/PEDOT:PSS double HILs offer a small staircase interface barrier, which enhance the hole injection and achieve a better charge balance. By using this double HIL regular planar architecture device, the maximum external quantum efficiency (ηEQE) reaches 18.09% and over 13355 h of lifetime. The related control PEDOT:PSS-based and V2O5-based QLEDs have maximum ηEQE of 13.79% and 9.13% with 6117 and 30881 h of lifetime, respectively. Due to the enhanced hole injection with the staircase interface barrier, the double HIL architecture QLEDs also have a high ηEQE above 15.00% over a wide range of 900–26000 cd m−2 with a low efficiency roll-off. These discoveries support the use of inorganic transition metal oxides as HILs for QLEDs with high efficiency and brightness for long operational lifetimes.



中文翻译:

具有阶梯V 2 O 5 / PEDOT:PSS空穴注入层界面势垒的高效稳定量子点发光二极管

过渡金属氧化物替代聚(3,4-乙撑二氧噻吩):聚(苯乙烯磺酸盐)(PEDOT:PSS)的应用中导致滞后的主要瓶颈是量子点发光二极管(QLED)的相对较低水平的效率),即使它们可以提高设备的稳定性。高性能QLED使用具有双空穴注入层(HIL)结构的低成本,可靠且经过全溶液处理的空穴注入材料制造而成,使用寿命长。氧化钒(V 2 O 5)/ PEDOT:PSS双HIL提供较小的阶梯界面势垒,可增强空穴注入并实现更好的电荷平衡。通过使用这种双HIL常规平面架构设备,最大外量子效率(η EQE)达到18.09%,并且使用寿命超过13355小时。相关的控制PEDOT:基于PSS和V 2 ö 5个系QLEDs具有最大η EQE的13.79%和9.13%分别寿命的6117和30881小时,。由于与楼梯界面屏障增强的空穴注入,双HIL架构QLEDs也具有高的η EQE 15.00%以上在宽范围的900-26000 CD米-2具有低效率的滚降。这些发现支持使用无机过渡金属氧化物作为高效率和高亮度的QLED的HIL,以延长使用寿命。

更新日期:2019-12-11
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