Abstract Optical and structural properties of Niobium and Zirconium bilayer structures (Nb/Zr and Zr/Nb) were investigated in order to develop free-standing transmittance filters in the Extreme Ultraviolet region (EUV) between 5 and 20 nm. Samples of Nb/Zr and Zr/Nb were deposited on Silicon Nitride (Si3N4) membranes by magnetron sputtering technique, using metallic targets of Nb and Zr. A single layer of Zr and Nb on Si3N4 membrane has also been deposited and studied for a better understanding of the performance of these structures and their optical and mechanical properties. Optical microscope images of Zr and Zr/Nb structures on the membranes reveal compressive stress while Nb and Nb/Zr structures present tensile stress behavior. Nb and Nb/Zr self-standing filters were obtained by etching the silicon nitride membrane, with free-standing areas up to 3 × 3 mm2 with 100 nm of thickness. The transmittance performance of the samples has been measured by using EUV synchrotron radiation. The results show the highest peak transmittance of 60% at 7.02 nm and very good performance in the targeted range.

中文翻译：

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基于 Si3N4 膜上的 Nb/Zr 和 Zr/Nb 薄膜，用于高亮度光源的极紫外独立透射滤光片：设计、制造、光学和结构表征

摘要 研究了铌和锆双层结构（Nb/Zr 和 Zr/Nb）的光学和结构特性，以开发在 5 到 20 nm 之间的极紫外区域 (EUV) 中的独立透射滤光片。使用 Nb 和 Zr 金属靶，通过磁控溅射技术将 Nb/Zr 和 Zr/Nb 样品沉积在氮化硅 (Si3N4) 膜上。为了更好地了解这些结构的性能及其光学和机械性能，还沉积并研究了 Si3N4 膜上的单层 Zr 和 Nb。膜上 Zr 和 Zr/Nb 结构的光学显微镜图像显示压缩应力，而 Nb 和 Nb/Zr 结构呈现拉伸应力行为。Nb 和 Nb/Zr 自立式过滤器是通过蚀刻氮化硅膜获得的，独立区域高达 3 × 3 mm2，厚度为 100 nm。样品的透射性能已通过使用 EUV 同步辐射测量。结果显示在 7.02 nm 处的最高峰值透射率为 60%，并且在目标范围内具有非常好的性能。