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Biomimetic diodon-skin nanothorn polymer antireflection film for solar cell applications
Solar Energy Materials and Solar Cells ( IF 6.3 ) Pub Date : 2020-03-01 , DOI: 10.1016/j.solmat.2019.110305
Chaolong Fang , Zhitong Yang , Jian Zhang , Youyi Zhuang , Siyuan Liu , Xin He , Yaoju Zhang

Abstract A biomimetic diodon-skin nanothorn (DSNT) epoxy resin antireflection (AR) film was presented to reduce the incident reflection loss of Si solar cell and thus improve power conversion efficiency (PCE). The fabricated epoxy resin DSNT film, designed using finite-difference time-domain method, was added on bare Si substrate using a polydimethylsiloxane (PDMS) stamps with soft imprint lithography. Optical characteristics showed the reflection was reduced in wavelength range of 300–1100 nm from 40.0% of bare Si substrate to 15.8% of epoxy resin DSNT film/Si substrate. In addition, we found the designed DSNT structure can be facilely transferred onto any flat substrates without deformation into unexpected shapes using soft imprint lithography. Moreover, the epoxy resin DSNT film exhibited superior hydrophobic and self-cleaning properties. By introducing the epoxy resin DSNT film on top of Si solar cell, the reflection loss of the Si solar cell was reduced by 7.8% and thus the PCE was increased from 18.99% to 19.88%. Thus, the epoxy resin DSNT film is a good candidate of AR film for photovoltaic application.

中文翻译:

用于太阳能电池应用的仿生diodon-skin纳米刺聚合物减反射膜

摘要 提出了一种仿生的diodon-skin nanothorn (DSNT)环氧树脂减反射(AR)薄膜,以减少Si太阳能电池的入射反射损失,从而提高功率转换效率(PCE)。使用有限差分时域方法设计的制造的环氧树脂 DSNT 薄膜被添加到裸硅衬底上,使用聚二甲基硅氧烷 (PDMS) 印章和软压印光刻。光学特性表明,从 40.0% 的裸硅衬底到 15.8% 的环氧树脂 DSNT 膜/硅衬底,反射在 300-1100 nm 的波长范围内降低。此外,我们发现设计的 DSNT 结构可以使用软压印光刻轻松转移到任何平面基板上,而不会变形为意想不到的形状。此外,环氧树脂DSNT薄膜表现出优异的疏水性和自清洁性能。通过在硅太阳能电池顶部引入环氧树脂DSNT薄膜,硅太阳能电池的反射损耗降低了7.8%,PCE从18.99%提高到19.88%。因此,环氧树脂 DSNT 薄膜是用于光伏应用的 AR 薄膜的良好候选者。
更新日期:2020-03-01
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