Abstract The article elaborates upon the optimality of electroplating and surfactant coupled electroplating based chromium oxide barriers on the process and product characterization variables of Pd electroless plating during dense Pd composite membranes fabrication. Porous stainless steel discs with 100 nm pore size were deployed to fabricate Pd composite membranes on chromium oxide diffusion barriers prepared with electroplating (7.8 and 20 µm thickness) and surfactant assisted electroplating (7.1 and 12.5 µm thickness). These diffusion barrier films were obtained by subsequent oxidation of chrome plated films at 700 °C. Eventually, palladium films were achieved using rate enhanced Pd electroless plating associated with coupled surfactant and sonication under dropwise addition mode of reducing agent. The surfactant inclusion during chrome plating enabled higher Pd metal film thickness and plating rates but could not provide better pore densification characteristics of dense Pd-chromia-PSS membranes.

中文翻译：

---

表面活性剂诱导氧化铬屏障对钯复合膜性能特性的影响

摘要 本文详细阐述了电镀和表面活性剂偶联电镀氧化铬屏障对致密 Pd 复合膜制造过程中 Pd 化学镀工艺和产品表征变量的优化。部署具有 100 nm 孔径的多孔不锈钢圆盘，在通过电镀（7.8 和 20 µm 厚度）和表面活性剂辅助电镀（7.1 和 12.5 µm 厚度）制备的氧化铬扩散屏障上制造 Pd 复合膜。这些扩散阻挡膜是通过随后在 700 °C 下氧化镀铬膜获得的。最终，在逐滴添加还原剂的模式下，使用与偶联表面活性剂和超声处理相关的速率增强的 Pd 化学镀获得了钯膜。