Electrochemical Mechanics of Metal Thin Films: Charge‐Induced Reversible Surface Stress for Actuation,Advanced Electronic Materials

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Electrochemical Mechanics of Metal Thin Films: Charge‐Induced Reversible Surface Stress for Actuation
Advanced Electronic Materials ( IF 5.3 ) Pub Date : 2019-11-18 , DOI: 10.1002/aelm.201900364
Chuan Cheng _{1,

2,

3} , Patrick S. Grant ₂ , Lukas Lührs ₁

Affiliation

The intrinsic charge‐induced surface stress of Ni thin films during electrochemical reactions with an alkaline electrolyte is measured in situ. Surface stresses induced by H absorption/desorption, α‐Ni(OH)₂ formation, capacitive double‐layer charging, the α‐ to β‐Ni(OH)₂ transformation, and β‐Ni(OH)₂/β‐NiOOH redox reactions are identified, and each provided additive contributions to the overall stress state. Surface stresses are magnified in high‐surface‐area nanoporous Ni because local stress‐relaxation mechanisms are restricted when compared to a smooth Ni film. Ni film reversible tensile/compressive surface stresses correlate with anodic/cathodic potential scanning but with an opposite trend to that of a less reactive Au film. Surface stresses in the Ni films are up to 40 times that of Au films and suggest the possibility of using controlled surface‐stress generation for electrochemical actuation.

中文翻译：

金属薄膜的电化学力学：电荷诱导的可逆表面应力用于驱动

在与碱性电解质发生电化学反应期间，Ni薄膜固有的电荷诱导的表面应力是在原位测量的。H吸收/解吸，α-Ni（OH）_2的形成，电容性双层电荷，α-至β-Ni（OH）_2的转化以及β-Ni（OH）₂引起的表面应力识别/β-NiOOH氧化还原反应，每个反应都为整体应力状态提供累加作用。在高表面积纳米多孔Ni中，表面应力会放大，因为与光滑的Ni膜相比，局部应力松弛机制受到限制。Ni膜可逆的拉伸/压缩表面应力与阳极/阴极电势扫描相关，但与低反应性Au膜的趋势相反。Ni薄膜中的表面应力是Au薄膜的40倍，这表明使用可控制的表面应力生成进行电化学驱动的可能性。

更新日期：2020-01-13

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