Levamisole (LMS) and 4-phenylimidazole (PIZ), used as corrosion inhibitors of copper in sulfuric acid solution were explored by electrochemical tests, morphology analysis and theoretical calculation. At the concentration of 8 mM, the maximum corrosion inhibition efficiencies of LMS and PIZ are 99.03% and 95.84%, respectively. All test data found that LMS had better corrosion inhibition performance than PIZ. LMS is a cathodic corrosion inhibitor, while PIZ belongs to a mixed-type corrosion inhibitor. Electrochemical results indicate that the corrosion inhibition efficiency has the same trend when the concentration of corrosion inhibitor increases. Scanning electron microscope and atomic force microscope were applied to research the surface morphology of copper samples under different conditions. X-ray photoelectron spectroscopy and Langmuir adsorption isotherm model were utilized to explain adsorption means. What is more, Langmuir adsorption isotherm model indicates the coexistence of physisorption and chemisorption for the two inhibitors. Besides, the adsorption between LMS and copper is more prone to chemical adsorption. The mechanism of metallic copper and corrosion inhibitors was explored through quantum chemistry studies and molecular dynamics simulation.

通过电化学测试，形态分析和理论计算，探索了左旋咪唑（LMS）和4-苯基咪唑（PIZ）在硫酸溶液中用作铜的腐蚀抑制剂。在浓度为8 mM时，LMS和PIZ的最大腐蚀抑制效率分别为99.03％和95.84％。所有测试数据均发现，LMS具有比PIZ更好的缓蚀性能。LMS是阴极腐蚀抑制剂，而PIZ属于混合型腐蚀抑制剂。电化学结果表明，当缓蚀剂的浓度增加时，缓蚀效率具有相同的趋势。运用扫描电子显微镜和原子力显微镜研究了不同条件下铜样品的表面形貌。利用X射线光电子能谱和Langmuir吸附等温线模型解释了吸附方式。此外，Langmuir吸附等温线模型表明两种抑制剂同时存在物理吸附和化学吸附。此外，LMS和铜之间的吸附更倾向于化学吸附。通过量子化学研究和分子动力学模拟探索了金属铜和缓蚀剂的机理。