Estimating three-dimensional complex permittivity of a sample from the intensity recorded at the image plane of a microscope for various angles of illumination, as in optical Fourier ptychography microscopy, permits one to avoid the interferometric measurements of classical tomographic diffraction microscopes (TDMs). In this work, we present a general inversion scheme for processing intensities that can be applied to any microscope configuration (transmission or reflection, low or high numerical aperture), scattering regime (single or multiple scattering), or sample-holder geometries (with or without substrate). The inversion procedure is tested on a wide variety of synthetic experiments, and the reconstructions are compared to that of TDMs. In most cases, phaseless data yield the same result as complex data, thus paving the way toward a drastic simplification of TDM implementation.

中文翻译：

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用于无相光学衍射层析成像的多功能反演工具。

像光学傅里叶分型显微镜一样，根据在显微镜图像平面上记录的各种照明角度的强度估算样品的三维复介电常数，可以避免传统层析X射线衍射显微镜（TDM）的干涉测量。在这项工作中，我们为处理强度提出了一种通用的反演方案，该方案可应用于任何显微镜配置（透射或反射，低或高数值孔径），散射方式（单次或多次散射）或样品架几何形状（具有或不含底物）。在多种合成实验中测试了反演程序，并将重构结果与TDM进行了比较。在大多数情况下，无相位数据产生的结果与复杂数据相同，