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Preparation of polyhedral oligomeric silsesquioxane‐containing block copolymer with well‐controlled stereoregularity
Journal of Polymer Science Part A: Polymer Chemistry ( IF 2.869 ) Pub Date : 2019-09-16 , DOI: 10.1002/pola.29498
Sung‐Yu Tsai, Satoshi Kuretani, Kei Manabe, Toshiki Terao, Takahiro Komamura, Yoshihiro Agata, Noboru Ohta, Syuji Fujii, Yoshinobu Nakamura, Chien‐Lung Wang, Teruaki Hayakawa, Tomoyasu Hirai

Preparation of functional domains with a spacing of 10 nm is a benchmark set to fabricate next‐generation electronic devices. Organic–inorganic block copolymers form well‐ordered microphase separations with very small domain sizes. The design and preparation of a novel block copolymer consisting of syndiotactic polymethyl methacrylate (st‐PMMA) and polyhedral oligomeric silsesquioxane (POSS)‐functionalized polymethacrylate, designated as st‐PMMA‐b‐PMAPOSS, which can recognize functional molecules, are reported. The st‐PMMA segments form a helical structure and encapsulate C60 in the helical nanocavity, leading to the formation of an inclusion complex. Although the ordering of the domains is not high, C60 domains that are in a quasi‐equilibrium state, with about 10‐nm domain spacings, are generated using st‐PMMA‐b‐PMAPOSS that can recognize functional molecules. © 2019 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2019, 57, 2181–2189

中文翻译:

具有良好可控制立体规则性的多面体低聚倍半硅氧烷低聚嵌段共聚物的制备

准备间距为10 nm的功能域是制造下一代电子设备的基准。有机-无机嵌段共聚物可形成结构整齐的微相分离区,并具有非常小的畴尺寸。报告了一种新型嵌段共聚物的设计和制备,该共聚物由间规聚甲基丙烯酸甲酯(st- PMMA)和多面体低聚倍半硅氧烷(POSS)官能化的聚甲基丙烯酸酯组成,称为st- PMMA- b- PMAPOSS,可以识别功能分子。所述ST -PMMA链段形成螺旋结构和封装Ç 60在螺旋纳腔,导致包合配合物的形成。尽管域的顺序不高,但是C使用可识别功能分子的st- PMMA- b- PMAPOSS生成60个处于准平衡状态的结构域,它们具有约10nm的结构域间距。分级为4 +©2019 Wiley Periodicals,Inc.J.Polym。科学,A部分:Polym。化学 2019,57,2181–2189
更新日期:2019-09-16
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