We present the first fabrication of sub-10 nm nanopores in freestanding polymer membranes via a simple, cost-effective, high-throughput but deterministic fabrication method. Nanopores in the range of 10 nm were initially produced via a single-step nanoimprinting process, which was further reduced to sub-10 nm pores via a post-NIL polymer reflow process. The low shrinkage rate of 2.7 nm/min obtained under the conditions used for the reflow process was the key to achieving sub-10 nm pores with a controllable pore size. The fabricated SU-8 nanopore membranes were successfully employed for transient current measurements during the translocation of DNA molecules through the nanopores.

我们首次通过简单、经济、高通量但确定性的制造方法在独立式聚合物膜中制造亚 10 nm 纳米孔。10 nm 范围内的纳米孔最初是通过单步纳米压印工艺生产的，然后通过后 NIL 聚合物回流工艺进一步缩小到 10 nm 以下的孔。在用于回流工艺的条件下获得 2.7 nm/min 的低收缩率是实现亚 10 nm 孔且孔径可控的关键。制造的 SU-8 纳米孔膜成功地用于 DNA 分子通过纳米孔易位期间的瞬态电流测量。