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Structure and thermomechanical properties of superlattice-stabilized TiNbTaZrSiAlN high-entropy coating
Journal of Alloys and Compounds ( IF 6.2 ) Pub Date : 2024-05-05 , DOI: 10.1016/j.jallcom.2024.174736
Hua D. Zhang , Jian W. Du , Yu X. Xu , She Q. Wang , Li Chen

Stabilizing the phase structure is the prerequisite for obtaining excellent properties of film materials. Here, we construct a multi-layer superlattice structure including high-entropy sublayer to further tailor the structure and properties of Al-containing nitride coating. A fully cubic structure of TiNbTaZrSiAlN/TiAlN (HEN_M) multilayer is realized by stabilizing the cubic/wurtzite-mixed TiNbTaZrSiAlN (HEN) sublayers with the cubic TiAlN template layers. The coherent interface strain increases the hardness to 37.5 ± 1.1 GPa for HEN_M in comparison with the corresponding monolithic coatings with 28.2 ± 0.9 GPa for TiAlN and 22.2 ± 0.7 GPa for HEN. Simultaneously, the HEN_M multilayer shows the optimal Vickers indentation toughness. All coatings exhibit age-hardening characteristics stemming from the spinodal decomposition. Compared to TiAlN reaching its peak hardness of ∼32.9 ± 0.9 GPa at 900°C, the sluggish diffusion effect promotes HEN and HEN_M maintaining the maximum hardness of ∼25.6 ± 0.8 GPa and ∼39.6 ± 0.9 GPa upon annealing to 1100 and 1000°C, respectively. In addition, exposed to synthetic air at 850°C for 10 h, TiAlN coating has been completely oxidized, whereas the HEN and HEN_M coatings only experience partial oxidation with oxide scales of ∼1.52 and 0.78 μm.

中文翻译:


超晶格稳定TiNbTaZrSiAlN高熵涂层的结构与热机械性能



稳定相结构是薄膜材料获得优异性能的前提。在这里,我们构建了包括高熵子层的多层超晶格结构,以进一步定制含铝氮化物涂层的结构和性能。通过使用立方 TiAlN 模板层稳定立方/纤锌矿混合 TiNbTaZrSiAlN (HEN) 子层,实现了 TiNbTaZrSiAlN/TiAlN (HEN_M) 多层的全立方结构。相干界面应变将 HEN_M 的硬度提高至 37.5 ± 1.1 GPa,而相应的整体涂层(TiAlN 为 28.2 ± 0.9 GPa)和 HEN 为 22.2 ± 0.7 GPa。同时,HEN_M 多层显示出最佳的维氏压痕韧性。所有涂层均表现出源自旋节线分解的时效硬化特性。与 TiAlN 在 900°C 时达到峰值硬度 ~32.9 ± 0.9GPa 相比,缓慢的扩散效应促使 HEN 和 HEN_M 在退火至 1100°C 和 1000°C 时保持最大硬度 ~25.6 ± 0.8GPa 和 ~39.6 ± 0.9GPa , 分别。此外,在850°C的合成空气中暴露10小时,TiAlN涂层已完全氧化,而HEN和HEN_M涂层仅经历部分氧化,氧化皮为~1.52和0.78μm。
更新日期:2024-05-05
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