Styrene hydroformylation over RhP loaded on different oxides was compared to investigate support effects on catalytic performance. The electron density of Rh was probed by CO-DRIFTS, and the acid-base properties of the catalysts were detected by NH- and CO-TPD. RhP had higher electron density when loaded on basic supports, and -type semiconductor showed additional electron donation effects compared to isolators. A kinetics model was established to identify hydrogen addition as the rate-determining step, and the changes in rate constant and adsorption equilibrium with different supports were compared. Electron donation from the supports was found to promote the activity of RhP via weakening styrene and aldehyde adsorption and facilitating hydrogen addition. The advantage of using CeO (, basic oxide with -type semiconductivity) as the support was suggested.

中文翻译：

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通过结合表征和动力学了解 Rh2P 催化苯乙烯加氢甲酰化的支持效应

比较了负载在不同氧化物上的 RhP 上的苯乙烯加氢甲酰化，以研究载体对催化性能的影响。采用CO-DRIFTS检测Rh的电子密度，采用NH-和CO-TPD检测催化剂的酸碱性质。 RhP负载在基础支撑上时具有更高的电子密度，并且与隔离器相比，β型半导体表现出额外的电子捐赠效应。建立了动力学模型，将加氢确定为速率决定步骤，并比较了不同载体的速率常数和吸附平衡的变化。研究发现，来自载体的电子捐赠可以通过削弱苯乙烯和醛的吸附并促进氢加成来促进 RhP 的活性。提出了使用CeO（具有β型半导体性质的碱性氧化物）作为载体的优点。