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A Zn-Al-Zr layered double hydroxide/graphene oxide nanocomposite enables rapid photocatalytic removal of kanamycin-resistance bacteria and genes via nano-confinement effects
Applied Catalysis B: Environment and Energy ( IF 22.1 ) Pub Date : 2024-03-06 , DOI: 10.1016/j.apcatb.2024.123922
Miao Yu , Dawei Liu , Lichao Wang , Jing Xia , Jianhui Ren , Yuqiu Fan , Xiaofeng Zhu , Jun Wang , Kun Xiong

For efficient removal of the antibiotic-resistance bacteria and antibiotic-resistance genes, zirconium-doped zinc-aluminum layered double hydroxide/graphene oxide (Zn-Al-Zr LDHs/GO) nanocomposite has been developed. The Zn-Al-Zr LDHs/GO shows outstanding photocatalytic sterilization, inactivating kanamycin-resistance E. coli (6.53 log CFU/mL) under the full-wavelength light irradiation within 50 minutes. Owing to the O formation, it greatly disrupts the respiratory chain of the kanamycin-resistance E. coli, thereby leading to a declined yield of adenosine triphosphate, down-regulated expressions of the DNA ligase and polymerase proteins, as well as completely inhibited expressions of the DNA repair proteins. Meanwhile, the strong adsorption capability of the Zn-Al-Zr LDHs/GO towards phosphorus endows it with special nano-confinement effects for ARGs. It results in significantly enriched local concentration of the kanamycin-resistance genes on the Zn-Al-Zr LDHs/GO, consequently enhanced removal ability towards the kanamycin-resistance genes (4.70 log copies/mL in 3 hours). This work provides a new strategy for effectively removing the ARB and ARGs.

中文翻译:

Zn-Al-Zr层状双氢氧化物/氧化石墨烯纳米复合材料能够通过纳米限制效应快速光催化去除卡那霉素耐药细菌和基因

为了有效去除抗生素耐药细菌和抗生素耐药基因,开发了锆掺杂锌铝层状双氢氧化物/氧化石墨烯(Zn-Al-Zr LDHs/GO)纳米复合材料。 Zn-Al-Zr LDHs/GO表现出出色的光催化灭菌能力,在全波长光照射下50分钟内即可灭活卡那霉素耐药性大肠杆菌(6.53 log CFU/mL)。由于O的形成,它极大地破坏了耐卡那霉素大肠杆菌的呼吸链,从而导致三磷酸腺苷产量下降,下调DNA连接酶和聚合酶蛋白的表达,并完全抑制DNA修复蛋白。同时,Zn-Al-Zr LDHs/GO对磷的强吸附能力使其对ARGs具有特殊的纳米限域效应。它导致 Zn-Al-Zr LDHs/GO 上卡那霉素抗性基因的局部浓度显着富集,从而增强了对卡那霉素抗性基因的去除能力(3 小时内 4.70 log 拷贝/mL)。这项工作为有效去除 ARB 和 ARGs 提供了新的策略。
更新日期:2024-03-06
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