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A Photopatternable Conjugated Polymer with Thermal-Annealing-Promoted Interchain Stacking for Highly Stable Anti-Counterfeiting Materials
Advanced Materials ( IF 27.4 ) Pub Date : 2023-05-31 , DOI: 10.1002/adma.202303120 Chengwei Liu 1 , Ann-Kathrin Steppert 2 , Yazhi Liu 1, 3 , Philipp Weis 3 , Jianyu Hu 4 , Chen Nie 1 , Wen-Cong Xu 1 , Alexander J C Kuehne 2 , Si Wu 1
Advanced Materials ( IF 27.4 ) Pub Date : 2023-05-31 , DOI: 10.1002/adma.202303120 Chengwei Liu 1 , Ann-Kathrin Steppert 2 , Yazhi Liu 1, 3 , Philipp Weis 3 , Jianyu Hu 4 , Chen Nie 1 , Wen-Cong Xu 1 , Alexander J C Kuehne 2 , Si Wu 1
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Photoresponsive polymers can be conveniently used to fabricate anti-counterfeiting materials through photopatterning. However, an unsolved problem is that ambient light and heat can damage anti-counterfeiting patterns on photoresponsive polymers. Herein, photo- and thermostable anti-counterfeiting materials are developed by photopatterning and thermal annealing of a photoresponsive conjugated polymer (MC-Azo). MC-Azo contains alternating azobenzene and fluorene units in the polymer backbone. To prepare an anti-counterfeiting material, an MC-Azo film is irradiated with polarized blue light through a photomask, and then thermally annealed under the pressure of a photonic stamp. This strategy generates a highly secure anti-counterfeiting material with dual patterns, which is stable to sunlight and heat over 200 °C. A key for the stability is that thermal annealing promotes interchain stacking, which converts photoresponsive MC-Azo to a photostable material. Another key for the stability is that the conjugated structure endows MC-Azo with desirable thermal properties. This study shows that the design of photopatternable conjugated polymers with thermal-annealing-promoted interchain stacking provides a new strategy for the development of highly stable and secure anti-counterfeiting materials.
中文翻译：
具有热退火促进链间堆叠的可光图案化共轭聚合物，用于高度稳定的防伪材料
光响应聚合物可以方便地通过光图案化来制造防伪材料。然而，一个尚未解决的问题是环境光和热会损坏光响应聚合物上的防伪图案。本文通过光响应共轭聚合物（MC-Azo）的光图案化和热退火开发了光稳定和热稳定的防伪材料。MC-Azo 在聚合物主链中含有交替的偶氮苯和芴单元。为了制备防伪材料，MC-Azo 薄膜通过光掩模用偏振蓝光照射，然后在光子印模的压力下进行热退火。该策略产生了一种高度安全的双图案防伪材料，该材料对阳光和超过 200°C 的热量保持稳定。稳定性的关键在于热退火促进链间堆积，从而将光响应性 MC-Azo 转化为光稳定材料。稳定性的另一个关键是共轭结构赋予 MC-Azo 理想的热性能。这项研究表明，热退火促进链间堆叠的可光图案化共轭聚合物的设计为开发高度稳定和安全的防伪材料提供了新策略。
更新日期：2023-05-31
中文翻译：
具有热退火促进链间堆叠的可光图案化共轭聚合物，用于高度稳定的防伪材料
光响应聚合物可以方便地通过光图案化来制造防伪材料。然而，一个尚未解决的问题是环境光和热会损坏光响应聚合物上的防伪图案。本文通过光响应共轭聚合物（MC-Azo）的光图案化和热退火开发了光稳定和热稳定的防伪材料。MC-Azo 在聚合物主链中含有交替的偶氮苯和芴单元。为了制备防伪材料，MC-Azo 薄膜通过光掩模用偏振蓝光照射，然后在光子印模的压力下进行热退火。该策略产生了一种高度安全的双图案防伪材料，该材料对阳光和超过 200°C 的热量保持稳定。稳定性的关键在于热退火促进链间堆积，从而将光响应性 MC-Azo 转化为光稳定材料。稳定性的另一个关键是共轭结构赋予 MC-Azo 理想的热性能。这项研究表明，热退火促进链间堆叠的可光图案化共轭聚合物的设计为开发高度稳定和安全的防伪材料提供了新策略。
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