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Programmable Nanoscale Crack Lithography for Multiscale PMMA Patterns
ACS Applied Materials & Interfaces ( IF 8.3 ) Pub Date : 2023-05-31 , DOI: 10.1021/acsami.3c02625 Zhiwen Shu 1, 2 , Fuhua Ye 1 , Peng Liu 3 , Pei Zeng 4 , Huikang Liang 1, 2 , Lei Chen 1, 2 , Xiaoqing Zhang 1 , Yiqin Chen 1, 2, 5 , Zhichao Fan 1 , Jianwu Yu 1 , Huigao Duan 1, 2, 5
ACS Applied Materials & Interfaces ( IF 8.3 ) Pub Date : 2023-05-31 , DOI: 10.1021/acsami.3c02625 Zhiwen Shu 1, 2 , Fuhua Ye 1 , Peng Liu 3 , Pei Zeng 4 , Huikang Liang 1, 2 , Lei Chen 1, 2 , Xiaoqing Zhang 1 , Yiqin Chen 1, 2, 5 , Zhichao Fan 1 , Jianwu Yu 1 , Huigao Duan 1, 2, 5
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Crack lithography is important for preparing microstructured materials. This strategic use of cracking breaks with the traditional idea that cracks are unwanted and has great potential for high-resolution and high-throughput production. However, the ability to control nanoscale crack patterning is still insufficient. Here, we present a nanoscale, programmable angle-dependent technique to control crack generation that relies on standard electron-beam lithography. Multiscale patterns of poly(methyl methacrylate) of arbitrary shape, geometric size, and large area were obtained, greatly expanding the processing capacity of electron-beam lithography. In addition, we observed the interaction between adjacent structures and cracks, which resulted in crack suppression or second-order cracks. We also demonstrated that angle-dependent nanoscale cracks can be used in physical unclonable functions and have great application prospects in the field of information security. We believe that our strategy for programmable nanoscale crack patterning provides new opportunities and perspectives for nanofabrication.
中文翻译：
用于多尺度 PMMA 图案的可编程纳米级裂纹光刻
裂纹光刻对于制备微结构材料很重要。这种裂解的策略性使用打破了裂纹是不需要的传统观念，具有高分辨率和高通量生产的巨大潜力。然而，控制纳米级裂纹图案化的能力仍然不足。在这里，我们提出了一种纳米级、可编程的角度相关技术来控制依赖于标准电子束光刻的裂纹生成。获得了任意形状、几何尺寸和大面积的聚（甲基丙烯酸甲酯）多尺度图案，极大地扩展了电子束光刻的加工能力。此外，我们观察了相邻结构与裂纹之间的相互作用，从而导致裂纹抑制或二阶裂纹。我们还证明了角度相关的纳米级裂纹可用于物理不可克隆功能，在信息安全领域具有巨大的应用前景。我们相信，我们的可编程纳米级裂纹图案化策略为纳米制造提供了新的机会和前景。
更新日期：2023-05-31
中文翻译：
用于多尺度 PMMA 图案的可编程纳米级裂纹光刻
裂纹光刻对于制备微结构材料很重要。这种裂解的策略性使用打破了裂纹是不需要的传统观念，具有高分辨率和高通量生产的巨大潜力。然而，控制纳米级裂纹图案化的能力仍然不足。在这里，我们提出了一种纳米级、可编程的角度相关技术来控制依赖于标准电子束光刻的裂纹生成。获得了任意形状、几何尺寸和大面积的聚（甲基丙烯酸甲酯）多尺度图案，极大地扩展了电子束光刻的加工能力。此外，我们观察了相邻结构与裂纹之间的相互作用，从而导致裂纹抑制或二阶裂纹。我们还证明了角度相关的纳米级裂纹可用于物理不可克隆功能，在信息安全领域具有巨大的应用前景。我们相信，我们的可编程纳米级裂纹图案化策略为纳米制造提供了新的机会和前景。
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