One of the key challenges in the field of flexible electronics relies on finding conductive materials that can withstand bending and stretching stresses while maintaining their performance. In this context, this work presents a comparative study of laser-induced conductive materials from the direct laser-scribing of two commercial flexible films: the benchmark Kapton® HN polyimide (PI) precursor and the Ultem^TM 1000 polyetherimide (PEI) alternative contender. The synthesis process on both materials is optimized in terms of electrical conductivity using a high-performance galvanometric laser with a wavelength of 532 nm for the fabrication of multiple samples at different laser powers and speeds. The samples are structurally characterized using Scanning Electron Microscopy (SEM), Raman spectroscopy, X-ray Photoelectron Spectroscopy (XPS), and Fourier-Transform Infrared Spectroscopy (FTIR) aiming at understanding the chemical and physical changes of the ablated material. The results demonstrate that the proposed setup is feasible for the synthesis of uniform and reliable conductive patterns on the surface of both substrates with high reproducibility. In particular, it is proved that PEI is more suitable precursor for flexible electronics applications which demand high electrical conductivity, leading to a sheet resistance of 3.62 ± 0.35 Ω/sq at 0.8 W and 5 mm/s once the laser-synthesis process is optimized (against the 6.04 ± 0.63 Ω/sq at 0.6 W and 5 mm/s offered by the LIG on PI). The performance of both laser-induced patterns as electrodes for the fabrication of electrochemical capacitors is also studied and compared in terms of areal specific capacitance.

柔性电子领域的主要挑战之一是找到能够承受弯曲和拉伸应力同时保持其性能的导电材料。在这种情况下，这项工作对两种商业柔性薄膜的直接激光划线激光诱导导电材料进行了比较研究：基准 Kapton® HN 聚酰亚胺 (PI) 前体和 Ultem ^TM1000聚醚酰亚胺（PEI）的替代竞争者。使用波长为 532 nm 的高性能检流计激光器在不同激光功率和速度下制造多个样品，这两种材料的合成过程在导电性方面得到了优化。使用扫描电子显微镜 (SEM)、拉曼光谱、X 射线光电子能谱 (XPS) 和傅里叶变换红外光谱 (FTIR) 对样品进行结构表征，旨在了解烧蚀材料的化学和物理变化。结果表明，所提出的设置对于在两种基板表面上以高再现性合成均匀可靠的导电图案是可行的。尤其，事实证明，PEI 更适合要求高导电性的柔性电子应用的前体，一旦激光合成工艺得到优化（相对于PI 上的 LIG 在 0.6 W 和 5 mm/s 时为 6.04 ± 0.63 Ω/sq）。还研究了两种激光诱导图案作为电化学电容器制造电极的性能，并根据面积比电容进行了比较。