Plasmonic optical nanolithography using extraordinary optical transmission through a metallic nanohole mask has been actively applied to the high-resolution fabrication of nanostructures over a large area. Although there have been studies on improving the nanostructure fabrication performance in optical nanolithography, such as on adjustable external gap spacing, additional performance enhancement is required for practical applications and commercialization of large-area and high-resolution nanostructure array fabrication techniques. In this study, we design and apply a plasmonic bull’s eye nanostructured meta-mask to enhance the performance of optical nanolithography. Through simulation results and experimental verification, it is confirmed that advanced optical nanolithography using the bull’s eye nanostructured meta-mask has several merits compared to conventional Talbot lithography using nanoholes: (1) Optical nanolithography using the bull’s eye nanostructured meta-mask effectively fabricates nanopillar arrays even at a shorter exposure time than conventional optical lithography using nanoholes. (2) It is possible to create a large-area nanopillar array with various nanopillar diameters by exposure time control in optical nanolithography using the bull’s eye meta-mask. (3) Using water or objective immersion oil to increase the refractive index of the contact medium, light can be focused on smaller sizes, and large-area nanopillar arrays with smaller nanopillar diameters are established. With the upgradation of hardware for large-area fabrication, application of immersion media supplying techniques, and additional studies to establish complex nanostructures, optical nanolithography using the bull’s eye nanostructured meta-mask is an efficient modality to produce various nanostructure-based devices.

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通过牛眼纳米结构元掩模增强传输的高级光学纳米光刻

使用通过金属纳米孔掩模的非凡光学传输的等离子体光学纳米光刻已被积极应用于大面积纳米结构的高分辨率制造。尽管已经有关于提高光学纳米光刻中纳米结构制造性能的研究，例如可调节的外部间隙间距，但大面积和高分辨率纳米结构阵列制造技术的实际应用和商业化需要额外的性能增强。在这项研究中，我们设计并应用等离子体牛眼纳米结构元掩模来增强光学纳米光刻的性能。通过仿真结果和实验验证，已经证实，与使用纳米孔的传统 Talbot 光刻相比，使用牛眼纳米结构元掩模的先进光学纳米光刻具有几个优点：（1）使用牛眼纳米结构元掩模的光学纳米光刻即使在比短的曝光时间下也能有效地制造纳米柱阵列使用纳米孔的传统光学光刻。(2) 可以通过使用牛眼元掩模在光学纳米光刻中控制曝光时间来创建具有各种纳米柱直径的大面积纳米柱阵列。(3)利用水或物镜浸油增加接触介质的折射率，使光线聚焦在更小的尺寸上，建立纳米柱直径更小的大面积纳米柱阵列。随着大面积制造硬件的升级，