Fused silica is an optical material with excellent performance, and it is widely used in the fabrication of optics in various high-power laser systems. With the gradual improvement of laser systems, the quality of optics becomes crucial. Taking magnetorheological finishing (MRF), ion beam sputtering etching (IBSE), and advanced mitigation processing (AMP) as the means, this work focuses on exploring the damage characteristics evolution of fused silica under different techniques. In this work, IBSE technique was used to determinedly polish the optical surface after removing damage layer by MRF technique, and AMP technique was applied to etch the surface with a certain depth. Then, 10 J/cm² (355 nm, 5 ns) laser was used to irradiate the optical surface, and the damage density of optics maintained at a low level, about 0.001/mm², which proves that MRF, IBSE, and AMP techniques can effectively improve the laser damage resistance of optics.

中文翻译：

---

熔融石英在离子束溅射和 AMP 技术下的损伤特性研究

熔融石英是一种性能优良的光学材料，广泛应用于各种高功率激光系统的光学器件制造。随着激光系统的逐步完善，光学质量变得至关重要。本工作以磁流变抛光（MRF）、离子束溅射刻蚀（IBSE）和先进缓蚀处理（AMP）为手段，着重探索不同工艺下熔融石英的损伤特性演变。本工作采用IBSE技术对MRF技术去除损伤层后的光学表面进行定性抛光，并采用AMP技术对表面进行一定深度的蚀刻。那么，10 J/cm ²(355 nm, 5 ns)激光照射光学表面，光学器件的损伤密度保持在较低水平，约为0.001/mm 2 ，证明^MRF、IBSE、AMP技术可以有效改善激光损伤光学电阻。