General-Purpose Algorithm for Two-Material Minimum Feature Size Enforcement of Freeform Nanophotonic Devices,ACS Photonics

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General-Purpose Algorithm for Two-Material Minimum Feature Size Enforcement of Freeform Nanophotonic Devices
ACS Photonics ( IF 6.5 ) Pub Date : 2022-11-18 , DOI: 10.1021/acsphotonics.2c01166
Ronald P. Jenkins ₁ , Sawyer D. Campbell ₁ , Douglas H. Werner ₁

Affiliation

A new iterative minimum feature size enforcement algorithm is presented for directly coercing two-material (i.e., fill and void regions) minimum length scales on freeform binary masks. The method is flexible, allowing for independent control over minimum widths, gaps, areas, and enclosed areas. Curvature constraints are automatically enforced in the process. A supercell optimization study is conducted using the method to demonstrate the relevance of the algorithm to state-of-the-art optical meta-lens design and fabrication. The proposed method can be used to characterize how freeform metasurface performance upper-bounds will decrease as minimum feature size enforcement increases. We show how this process is a critical prerequisite for realizing high-performance wafer-scale optical metasurfaces. Moreover, because this method can be employed to directly modify a binary mask, it is suitable for use with global and multiobjective optimization methods, making it more general purpose than existing methods used in topology optimization.

中文翻译：

用于自由形式纳米光子器件的双材料最小特征尺寸强制执行的通用算法

提出了一种新的迭代最小特征尺寸实施算法，用于直接强制自由形式二进制掩模上的两种材料（即填充和空隙区域）最小长度尺度。该方法灵活，允许独立控制最小宽度、间隙、面积和封闭区域。在此过程中会自动强制执行曲率约束。使用该方法进行了超级单元优化研究，以证明该算法与最先进的光学超透镜设计和制造的相关性。所提出的方法可用于表征随着最小特征尺寸实施的增加，自由曲面性能上限将如何降低。我们展示了这个过程如何成为实现高性能晶圆级光学超表面的关键先决条件。而且，

更新日期：2022-11-18

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