A thin-film model electrode was used to evaluate the performance of lowly and highly chlorine modified TiO₂ coatings. The coatings are applied using ALD on RF sputtered LiMn₂O₄ thin-films. Careful analysis of the ALD process indicates direct interaction between the precursor and the active material, leading to the formation of an interphase layer containing a high concentration of chlorine. Distinct differences in the performance of the two types of coatings arise dependent on the insertion potential (i.e. 3 V or 4 V insertion region) which was being evaluated. A link to the mechanical properties of the coating materials is hypothesized and evaluated using nanoindentation for mechanical assessment of TiO₂ and chlorine modified TiO₂.

中文翻译：

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氯改性 TiO2 涂层对 LMO 的化学机械效应

薄膜模型电极用于评估低氯和高氯改性 TiO ₂涂层的性能。涂层使用 ALD 施加在射频溅射的 LiMn ₂ O ₄薄膜上。对 ALD 工艺的仔细分析表明，前体和活性材料之间的直接相互作用，导致形成含有高浓度氯的界面层。两种涂层性能的明显差异取决于所评估的插入电位（即3 V 或 4 V 插入区域）。使用纳米压痕对 TiO _{2进行机械评估来假设和评估与涂层材料的机械性能的联系}和氯改性的TiO ₂。