Organogermanium(IV) compounds in photo-induced radical reactions,Organic Chemistry Frontiers

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Organogermanium(IV) compounds in photo-induced radical reactions
Organic Chemistry Frontiers ( IF 4.6 ) Pub Date : 2022-10-31 , DOI: 10.1039/d2qo01467j
Qing-Hao Xu ₁ , Bin Xiao ₁

Affiliation

Located between silicon and tin in the periodic table, organogermanium compounds have comparable abundant radical properties as well. According to earlier studies, various types of germanium compounds, such as acylgermanes, hydrogermanes, tetraalkylgermanes, and digermanes, could be key reagents in radical processes. As visible-light photocatalysis has developed into a major radical-generation approach in the past decade, some of these germyl compounds have also been applied to achieve germylation or alkylation reactions, indicating the great potential of germanium in modern radical systems. In this review, the mechanism and applications of these four types of organogermanium structures in photoinduced radical reactions are summarized.

中文翻译：

有机锗 (IV) 化合物在光诱导自由基反应中的作用

位于元素周期表中的硅和锡之间的有机锗化合物也具有相当丰富的自由基特性。根据早期的研究，各种类型的锗化合物，如酰基锗烷、氢锗烷、四烷基锗烷和二锗烷，可能是自由基过程中的关键试剂。随着可见光光催化在过去十年中发展成为一种主要的自由基生成方法，这些锗基化合物中的一些也被用于实现细菌化或烷基化反应，这表明锗在现代自由基系统中的巨大潜力。本文综述了这四种有机锗结构在光致自由基反应中的作用机理和应用。

更新日期：2022-10-31

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