Tuning structural properties, morphology and magnetic characteristics of nanostructured Ni-Co-Fe/ITO ternary alloys by galvanostatic pretreatment process,Microscopy Research and Technique

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Tuning structural properties, morphology and magnetic characteristics of nanostructured Ni-Co-Fe/ITO ternary alloys by galvanostatic pretreatment process
Microscopy Research and Technique ( IF 2.0 ) Pub Date : 2022-09-22 , DOI: 10.1002/jemt.24235
Umut Saraç ₁ , Dung Nguyen Trong _{2,

3} , Mevlana Celalettin Baykul ₄ , Van Cao Long ₂ , Ştefan Ţălu ₅

Affiliation

In this research, the structural properties, surface morphology, and magnetic characteristics of nanostructured ternary ferromagnetic alloys grown by a cost-effective and effortless two-step electrochemical deposition method on indium tin oxide (ITO) substrates with and without a galvanostatic pretreatment process (GPP) were examined. The GPP was applied at various pretreatment current densities (PCDs) such as −10, −20, and − 30 mA/cm². The effect of the PCD on the Ni, Co, and Fe contents is found to be insignificant and all resultant Ni-Co-Fe thin films show an abnormal co-deposition. The films have nano-sized crystallites ranging from 17.3 to 19.6 nm and showed a face-centered cubic structure with the [111] preferential growth. Compared to the non-GPP applied Ni-Co-Fe film, growing the ternary Ni-Co-Fe film on ITO at the PCD of −30 mA/cm² causes an improvement in the crystal quality and a reduction in the particle size from 150 ± 50 to 70 ± 20 nm. A decrement in the surface roughness and coercivity was also achieved by applying the GPP at the PCD of −30 mA/cm², but the opposite is true for the GPP performed at the PCD of −10 mA/cm². The GPP has an effect on the magnetic Squareness Ratio (SQR), but the influence of the PCD on the SQR parameter is negligible. The obtained findings reveal that the properties of the Ni-Co-Fe/ITO ternary alloys can be tuned through the GPP applied in various PCDs.

中文翻译：

通过恒电流预处理工艺调节纳米结构 Ni-Co-Fe/ITO 三元合金的结构性能、形貌和磁特性

在这项研究中，纳米结构三元铁磁合金的结构特性、表面形态和磁特性通过具有成本效益且毫不费力的两步电化学沉积方法在氧化铟锡 (ITO) 基板上生长，有和没有恒电流预处理工艺 (GPP) ) 进行了检查。GPP 在各种预处理电流密度 (PCD) 下应用，例如 -10、-20 和 - 30 mA/cm ². 发现 PCD 对 Ni、Co 和 Fe 含量的影响微不足道，所有生成的 Ni-Co-Fe 薄膜都显示出异常的共沉积。这些薄膜具有 17.3 至 19.6 nm 的纳米级微晶，并显示出具有 [111] 择优生长的面心立方结构。与非 GPP 应用的 Ni-Co-Fe 薄膜相比，以 -30 mA/cm ²的 PCD 在 ITO 上生长三元 Ni-Co-Fe 薄膜导致晶体质量的改善和粒径的减小150 ± 50 至 70 ± 20 纳米。^{通过在 -30 mA/cm 2}的 PCD 处应用 GPP 也实现了表面粗糙度和矫顽力的降低，但对于在 -10 mA/cm ²的 PCD 处执行的 GPP 则相反. GPP 对磁方形比 (SQR) 有影响，但 PCD 对 SQR 参数的影响可以忽略不计。获得的研究结果表明，Ni-Co-Fe/ITO 三元合金的性能可以通过应用于各种 PCD 的 GPP 进行调整。

更新日期：2022-09-22

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