当前位置：
X-MOL 学术
›
Adv. Electron. Mater.
›
论文详情
Our official English website, www.x-mol.net, welcomes your
feedback! (Note: you will need to create a separate account there.)
Probing Nanoscale Schottky Barrier Characteristics at WSe2/Graphene Heterostructures via Electrostatic Doping (Adv. Electron. Mater. 9/2022)
Advanced Electronic Materials ( IF 5.3 ) Pub Date : 2022-09-07 , DOI: 10.1002/aelm.202270044 Filipe Richheimer , Tom Vincent , Alessandro Catanzaro , Nathaniel J. Huáng , Mark A. Baker , Robert A. Dorey , Cristina E. Giusca , Fernando A. Castro , Olga Kazakova , Sebastian Wood
Advanced Electronic Materials ( IF 5.3 ) Pub Date : 2022-09-07 , DOI: 10.1002/aelm.202270044 Filipe Richheimer , Tom Vincent , Alessandro Catanzaro , Nathaniel J. Huáng , Mark A. Baker , Robert A. Dorey , Cristina E. Giusca , Fernando A. Castro , Olga Kazakova , Sebastian Wood
|
Nanoscale Schottky Barrier Characteristics
中文翻译：
通过静电掺杂探测 WSe2/石墨烯异质结构的纳米级肖特基势垒特性 (Adv. Electron. Mater. 9/2022)
纳米级肖特基势垒特性
更新日期：2022-09-08
中文翻译：
通过静电掺杂探测 WSe2/石墨烯异质结构的纳米级肖特基势垒特性 (Adv. Electron. Mater. 9/2022)
纳米级肖特基势垒特性
京公网安备 11010802027423号