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Mechanism insight into the photocatalytic degradation of fluoroquinolone antibiotics by the ZIF-8@Bi2MoO6 heterojunction
Environmental Science: Nano ( IF 5.8 ) Pub Date : 2022-09-06 , DOI: 10.1039/d2en00219a
Nguyen Trung Dung , Le Minh Thu , Thi Dieu Thuy Ung , Vu Tri Thien , Thi Thuy Nguyen , Nguyen Thi Cam Tien , Kun-Yi Andrew Lin , Nguyen Nhat Huy

This work reports a comprehensive study on the mechanisms for material formation, charge separation, persulfate activation, and photocatalytic degradation of fluoroquinolone antibiotics (e.g., ofloxacin (OFX), levofloxacin (LFX), and ciprofloxacin (CFX)) under LED visible light using the ZIF-8@Bi2MoO6 (BIZ) heterojunction. The BIZ heterojunction was synthesized by the combination of solvothermal and sol–gel methods and characterized by SEM, TEM, XRD, EDX, FTIR, PL, EIS, BET, TGA, and UV-vis DRS analyses. The results show that using 500 mg L−1 BIZ (10% ZIF-8) with 500 mg L−1 Na2S2O8, at unadjusted pH for 25 min of irradiation results in an excellent photocatalytic activity with a degradation efficiency of 56.52% CFX, 85.70% LFX, and 96.36% OFX. The OFX degradation rate constant by BIZ was 3.2 and 23.3 times higher than those by Bi2MoO6 and ZIF-8, respectively. These high efficiencies are attributed to the high charge separation rates for the photo-generated carriers in the heterojunction structure. The activity of radicals in the photocatalytic process as well as their role in the OFX removal was in the order of SO4˙ > O2˙ > h+ > 1O2 > HO˙. The mechanisms of charge separation, persulfate activation, and degradation pathway were then proposed for the photocatalytic removal of OFX using the BIZ heterojunction under visible light.

中文翻译:

ZIF-8@Bi2MoO6异质结光催化降解氟喹诺酮类抗生素的机理研究

这项工作报告了使用 LED 可见光下氟喹诺酮类抗生素(例如氧氟沙星 (OFX)、左氧氟沙星 (LFX) 和环丙沙星 (CFX))的材料形成、电荷分离、过硫酸盐活化和光催化降解机制的综合研究。ZIF-8@Bi 2 MoO 6 (BIZ)异质结。BIZ异质结通过溶剂热法和溶胶-凝胶法的组合合成,并通过SEM、TEM、XRD、EDX、FTIR、PL、EIS、BET、TGA和UV-vis DRS分析表征。结果表明,使用 500 mg L -1 BIZ (10% ZIF-8) 和 500 mg L -1 Na 2 S 2 O 8,在未调整的 pH 值下照射 25 分钟,产生了优异的光催化活性,降解效率为 56.52% CFX、85.70% LFX 和 96.36% OFX。BIZ的OFX降解速率常数分别是Bi 2 MoO 6和ZIF-8的3.2倍和23.3倍。这些高效率归因于异质结结构中光生载流子的高电荷分离率。自由基在光催化过程中的活性及其在OFX去除中的作用顺序为SO 4 ˙ - > O 2 ˙ - > h + > 1 O 2> 何˙。然后提出了电荷分离、过硫酸盐活化和降解途径的机理,用于在可见光下使用 BIZ 异质结光催化去除 OFX。
更新日期:2022-09-06
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