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Enhanced photoreactivity of MOFs by intercalating interlayer bands via simultaneous ?NCO and ?SCu modification
AIChE Journal ( IF 3.5 ) Pub Date : 2022-08-21 , DOI: 10.1002/aic.17879
Wei‐Fei Hu 1 , Shuo Chen 1 , Hong‐Chao Hao 1 , Hong Jiang 1
Affiliation  

Herein, we propose a novel method to enhance the photoreactivity of an MOF catalyst by grafting isocyanate bonds (NCO) and sulfhydryl-complexed copper (SCu) onto ZIF-8 (NIF-SCu). The grafting process intercalated interlayer bands between the conduction and valence bands of ZIF-8, thereby providing a “ladder” for facile electron transition. The extreme improvement in the photoreactivity of NIF-SCu could be attributed to the enhancement in light responses in the range of 350–450 nm by NCO groups and the widening of the visible light range of the MOF by SCu groups. The formation of staggered energy levels in NIF-SCu could also narrow the band gap, lower the resistance, and facilitate the transfer of photogenerated carriers, thereby generating electrons with strong reduction potential in the SCu conduction band. This study provides a new strategy for improving or even endowing the photoactivity of environmental functional materials with wide bandgaps.

中文翻译:

通过同时 ?NCO 和 ?SCu 修饰插入层间带来增强 MOF 的光反应性

在此,我们提出了一种通过将异氰酸酯键 ( NCO) 和巯基络合铜 ( SCu) 接枝到 ZIF-8 (NIF-SCu) 上来提高 MOF 催化剂光反应性的新方法。接枝过程在 ZIF-8 的导带和价带之间插入了层间带,从而为容易的电子跃迁提供了“阶梯”。NIF-SCu 的光反应性的极大改善可归因于 NCO 基团在 350-450 nm 范围内的光响应增强和 MOF 的可见光范围扩大SCU组。NIF-SCu中交错能级的形成还可以缩小带隙,降低电阻,促进光生载流子的转移,从而在SCu导带中产生具有强还原电位的电子。该研究为改善甚至赋予宽禁带环境功能材料的光活性提供了新的策略。
更新日期:2022-08-21
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