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Controlling the triboelectric properties and tribological behavior of polyimide materials via plasma treatment
Nano Energy ( IF 16.8 ) Pub Date : 2022-08-10 , DOI: 10.1016/j.nanoen.2022.107691
Xiao Sun , Yongjian Liu , Ning Luo , Ying Liu , Yange Feng , Shougang Chen , Daoai Wang

Surface charge density greatly influences triboelectric properties and tribological behavior. Given the limitations of current techniques for regulating surface charge, a novel plasma-irradiation-based surface treatment was used to enhance the triboelectric properties and optimize the tribological behavior of polyimide (PI) films. An in-situ two-step Ar+O2 reactive ion etching (RIE) plasma treatment was used to etch the surface of the PI films to enhance the triboelectric performance of PI-PA11-based triboelectric nanogenerators (TENGs). The generation of granular nanostructures on the PI film surface enhanced the effective contact area between triboelectric layers. The C-O and Cdouble bondO content was also greatly increased, improving the electron affinity of the PI films. At the same time, to obtain a fully antistatic PI surface in a PI-PVDF-based TENG, the optimal irradiation time was calculated. In addition, to control the tribological behavior, the surface charge of PI film was successfully eliminated by a one-step Ar plasma irradiation, and the regulation of the coefficient of friction was realized, which significantly improved the friction stability and wear resistance of the material. This new approach can find wide applications in energy harvesting, industrial production, electronic circuit, and other applications.



中文翻译:

通过等离子体处理控制聚酰亚胺材料的摩擦电性能和摩擦学行为

表面电荷密度极大地影响摩擦电特性和摩擦学行为。鉴于目前调节表面电荷技术的局限性,一种新型的基于等离子体辐照的表面处理被用于增强聚酰亚胺 (PI) 薄膜的摩擦电性能并优化摩擦学行为。采用原位两步 Ar+O 2反应离子蚀刻 (RIE) 等离子体处理蚀刻 PI 薄膜的表面,以提高 PI-PA11 基摩擦电纳米发电机 (TENG) 的摩擦电性能。在 PI 薄膜表面产生的颗粒状纳米结构增加了摩擦电层之间的有效接触面积。CO 和 C双键O含量也大大增加,提高了PI薄膜的电子亲和力。同时,为了在 PI-PVDF 基 TENG 中获得完全抗静电的 PI 表面,计算了最佳辐照时间。此外,为了控制摩擦学行为,通过一步Ar等离子体辐照成功消除了PI薄膜的表面电荷,实现了摩擦系数的调节,显着提高了材料的摩擦稳定性和耐磨性。 . 这种新方法可以在能量收集、工业生产、电子电路和其他应用中找到广泛的应用。

更新日期:2022-08-10
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