Abstract

The deposition processes of nanosized particles of silver, palladium and gold on the silicon surface by galvanic replacement in fluoride-containing solutions of AgNO₃ in DMF, Pd(NO₃)₂, and H[AuCl₄] in DMSO in an ultrasonic field are studied. The influence of the ultrasonic field on the geometry of metal particles and the morphology of precipitate on the substrate is described. It is shown that ultrasonication of (1–10) mM AgNO₃ solutions in DMF promotes the formation of nanostructured films on the silicon surface. The tendency to the nanofilms formation is also observed for gold. It was found that ultrasonication allows the deposition of gold on silicon by galvanic replacement in fluoride-free solutions of H[AuCl₄]. An increase of the temperature of the solution causes the formation of dispersed precipitates on the silicon surface and an increase of the particles size.

摘要

_{在 AgNO 3}的 DMF 溶液、Pd(NO ₃ ) ₂和 H[AuCl ₄ ] 的 DMSO 溶液中，在超声场中通过电流置换在硅表面沉积银、钯和金纳米粒子的过程是学习了。描述了超声场对金属颗粒几何形状和基体上析出物形貌的影响。结果表明，(1–10) mM AgNO _{3的超声处理}DMF 溶液促进硅表面纳米结构薄膜的形成。对于金也观察到纳米膜形成的趋势。据发现，超声波处理允许通过在 H[AuCl ₄ ] 的无氟化物溶液中进行电流置换而将金沉积在硅上。溶液温度的升高导致在硅表面上形成分散的沉淀物并且颗粒尺寸增加。