Visible-Light-Degradable 3D Microstructures in Aqueous Environments,Advanced Materials

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Visible-Light-Degradable 3D Microstructures in Aqueous Environments
Advanced Materials ( IF 27.4 ) Pub Date : 2022-08-02 , DOI: 10.1002/adma.202203474
Marvin Gernhardt _{1,

2} , Vinh X Truong _{1,

2} , Christopher Barner-Kowollik _{1,

2,

3}

Affiliation

The additive manufacturing technique direct laser writing (DLW), also known as two-photon laser lithography, is becoming increasingly established as a technique capable of fabricating functional 3D microstructures. Recently, there has been an increasing effort to impart microstructures fabricated using DLW with advanced functionalities by introducing responsive chemical entities into the underpinning photoresists. Herein, a novel photoresist based on the photochemistry of the bimane group is introduced that can be degraded upon exposure to very mild conditions, requiring only water and visible light (λ_max = 415–435 nm) irradiation. The degradation of the microstructures is tracked and quantified using AFM measurements of their height. The influence of the writing parameters as well as the degradation conditions is investigated, unambiguously evidencing effective visible light degradation in aqueous environments. Finally, the utility of the photodegradable resist system is demonstrated by incorporating it into multimaterial 3D microstructures, serving as a model for future applications.

中文翻译：

水环境中的可见光可降解 3D 微结构

增材制造技术直接激光写入 (DLW)，也称为双光子激光光刻，正日益成为一种能够制造功能性 3D 微结构的技术。最近，人们越来越努力地通过将响应性化学实体引入到支撑光刻胶中来赋予使用 DLW 制造的微结构以先进的功能。本文介绍了一种基于双烷基光化学的新型光刻胶，该光刻胶可在暴露于非常温和的条件下降解，仅需要水和可见光（λ _max = 415–435 nm) 照射。使用 AFM 测量其高度来跟踪和量化微结构的退化。研究了写入参数以及降解条件的影响，明确证明了在水性环境中有效的可见光降解。最后，通过将可光降解抗蚀剂系统结合到多材料 3D 微结构中来证明其实用性，作为未来应用的模型。

更新日期：2022-08-02

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