CF₄ is commonly used in semiconductor industries, and its removal requires a large amount of energy because it is a highly stable perfluorinated compound. In this study, a rotating arc-catalytic reactor that uses thermal plasma as the heat source for catalysts is introduced as an efficient method for CF₄ removal. An AC rotating arc plasma was used with the catalyst for CF₄ removal, and the plasma and catalyst were configured serially in this reactor. Destruction and removal efficiency (DRE) of CF₄ and the energy efficiency of the removal process were experimentally investigated in the input power range of 2–3 kW and a steam-to-CF₄ molar ratio of up to 20. The obtained results suggest that the DRE of CF₄ was up to 98% and the energy efficiency was as high as 36.1 g/kWh, which is approximately 3.5 times higher than that obtained using a rotating arc reactor alone. In addition, the thermal efficiency was estimated to be approximately 67%, based on the temperatures of the inlet and outlet gases of the rotating arc-catalytic reactor. Thus, further improvement in the performance can be expected through subsequent thermal management and system optimization. These results confirm that using rotating arc-catalytic reactors is an energy-efficient strategy for application as scrubber systems to remove CF₄.

CF ₄常用于半导体工业，由于它是一种高度稳定的全氟化合物，其去除需要大量的能量。在这项研究中，介绍了一种使用热等离子体作为催化剂热源的旋转电弧催化反应器，作为去除CF _{4的有效方法。}交流旋转电弧等离子体与催化剂一起用于CF ₄去除，等离子体和催化剂在该反应器中串联配置。在 2-3 kW 的输入功率范围和高达 20 的蒸汽与 CF _{4的摩尔比下，对 CF 4}的破坏和去除效率（DRE）和去除过程的能量效率进行了实验研究。获得的结果表明CF 的 DRE₄高达 98%，能量效率高达 36.1 g/kWh，比单独使用旋转电弧反应器获得的能量效率高约 3.5 倍。此外，根据旋转电弧催化反应器的入口和出口气体的温度，估计热效率约为 67%。因此，可以通过后续的热管理和系统优化来进一步提高性能。_{这些结果证实，使用旋转电弧催化反应器作为洗涤器系统去除CF 4}是一种节能策略。