Site-selective growth of two-dimensional materials: strategies and applications,Nanoscale

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Site-selective growth of two-dimensional materials: strategies and applications
Nanoscale ( IF 5.8 ) Pub Date : 2022-06-23 , DOI: 10.1039/d2nr02093a
Fan Liu ₁ , Jian Shi ₁ , Jinpeng Xu ₁ , Nannan Han ₁ , Yingchun Cheng _{1,

2} , Wei Huang _{1,

2}

Affiliation

Over the years, there have been major advances in two-dimensional (2D) materials on account of their excellent and unique properties. Among the various strategies for 2D material fabrication, chemical vapor deposition (CVD) is considered as the most promising method to achieve large-area and high-quality 2D film growth. Furthermore, to realize the potential applications of 2D materials in different fields, the integration of 2D materials into functional devices is essential. However, the materials made by common CVD are randomly distributed on substrates, which is disadvantageous for fabricating arrays of devices. To solve this problem, a site-selective growth method was developed to meet the requirement of batch production for practical applications because it achieves control over the locations of products and benefits the subsequent direct integration. Herein, state-of-the-art methods for site-selective synthesis, including seeded growth and patterned growth, are reviewed. Then, the electronic and optoelectronic applications of the as-grown 2D materials are also reviewed. Finally, the remaining challenges and future prospects regarding site-selective methods and applications are discussed.

中文翻译：

二维材料的选点生长：策略与应用

多年来，由于二维 (2D) 材料具有优异和独特的特性，它们取得了重大进展。在二维材料制造的各种策略中，化学气相沉积（CVD）被认为是实现大面积和高质量二维薄膜生长的最有希望的方法。此外，为了实现二维材料在不同领域的潜在应用，将二维材料集成到功能器件中是必不可少的。然而，普通CVD制作的材料在基板上随机分布，不利于器件阵列的制作。为了解决这个问题，为了满足批量生产的实际应用需求，开发了一种选址生长方法，因为它实现了对产品位置的控制，有利于后续的直接集成。本文综述了位点选择性合成的最新方法，包括种子生长和图案化生长。然后，还回顾了生长的二维材料的电子和光电应用。最后，讨论了有关选址方法和应用的剩余挑战和未来前景。

更新日期：2022-06-23

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