The synthesis of mixed silicon and germanium clusters Si_xGe_6−x{N(SiMe₃)Dipp}₄ 1–3 (x = 3.7, 3.1, 2.1) with amido-substituents and two unsubstituted germanium atoms was achieved in co-reductions using the tribromosilane {N(SiMe₃)Dipp}SiBr₃ and the tribromogermane {N(SiMe₃)Dipp}GeBr₃ in three different ratios. The ratio of Si and Ge used for the synthesis of 1–3 approximately corresponds to that in the final products. All compounds were characterized by single crystal X-ray diffraction and EI mass spectrometry. In addition, 1 and 2 were characterized by solid-state ²⁹Si{¹H} CP/MAS NMR spectroscopy and multinuclear NMR spectroscopy in solution.

中文翻译：

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不饱和酰胺取代六顶点混合硅锗簇

在共还原中实现了具有氨基取代基和两个未取代锗原子的混合硅和锗簇 Si _x Ge _{6− x} {N(SiMe ₃ )Dipp} ₄ 1-3 ( x = 3.7, 3.1, 2.1) 的合成使用三种不同比例的三溴硅烷{N(SiMe ₃ )Dipp}SiBr ₃和三溴锗烷{N(SiMe ₃ )Dipp}GeBr ₃。用于合成1-3的 Si 和 Ge 的比例大致对应于最终产品中的比例。所有化合物均通过单晶 X 射线衍射和 EI 质谱进行了表征。此外，1和2通过固态²⁹ Si{ ¹ H} CP/MAS NMR 光谱和溶液中的多核 NMR 光谱进行了表征。