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Structural design and experimental analysis for AlN Lamb-wave resonators with different electrical boundary conditions
Solid-State Electronics ( IF 1.4 ) Pub Date : 2022-06-22 , DOI: 10.1016/j.sse.2022.108404
Haiyan Sun , Shitao Lv , Fei Long , Chenguang Song , Xinyi Sun , Fazeng Tan , Jicong Zhao

This paper presents an Aluminum Nitride (AlN) Lamb-wave resonator with high series-resonance quality factors (Qs) and good spectral purity. The influence of the interdigitated (IDT) electrode width and electrical boundary condition was theoretically analyzed to improve effective electro-mechanical coupling coefficient (k2eff) and spectral purity. According to the structural characteristic of the designed resonators, an advanced micro-manufacturing process was designed. A thermal oxide layer was employed to avoid the etching of inactive regions, which contributes to achieving the high Qs and high-yield fabrication. The measured results show the IDT-ground resonators with 12 μm and 6 μm electrode periods exhibit Qs values as high as 4457.1 and 2625.1, and k2eff of 0.61% and 0.33%, respectively. The IDT-IDT resonators have higher k2eff, but their Qs values are severely attenuated. Through observing their section morphologies, the measured shear angles of the bottom IDT electrodes with 12 μm and 6 μm periods are 54.95° and 65.7° respectively, and the surface AlN film has tiny cracks, which induces the performance deterioration of the IDT-IDT resonators. Moreover, the influence of the IDT material on the resonator’s performance was also analyzed.



中文翻译:

不同电边界条件下AlN兰姆波谐振器的结构设计与实验分析

本文介绍了一种具有高串联谐振品质因数 ( Q s ) 和良好光谱纯度的氮化铝 (AlN) 兰姆波谐振器。理论上分析了叉指(IDT)电极宽度和电边界条件的影响,以提高有效机电耦合系数(k 2 eff)和光谱纯度。根据所设计谐振器的结构特点,设计了一种先进的微制造工艺。采用热氧化层来避免蚀刻非活性区域,这有助于实现高Q s和高产制造。测量结果表明,电极周期为 12 μm 和 6 μm 的 IDT 接地谐振器的Q s值分别高达 4457.1 和 2625.1,k 2 eff分别为 0.61% 和 0.33%。IDT-IDT 谐振器具有更高的k 2 eff,但它们的Q s值严重衰减。通过观察它们的截面形貌,12 μm和6 μm周期的底部IDT电极的实测剪切角分别为54.95°和65.7°,表面AlN薄膜有微小的裂纹,导致IDT-IDT谐振器的性能劣化. 此外,还分析了IDT材料对谐振器性能的影响。

更新日期:2022-06-26
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