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Role of Halogen Doping on Ionic Diffusion in the Grain Boundary Structure of Cubic Na3PS4: Ab Initio Molecular Dynamic Study
The Journal of Physical Chemistry C ( IF 3.3 ) Pub Date : 2022-06-16 , DOI: 10.1021/acs.jpcc.2c02847
Ruibin He 1 , Zhonghui Hu 1 , Junjie Gao 1 , Guangxuan Zhang 1 , Kun Shen 1
Affiliation  

Using halogen doping to introduce Na vacancies is an effective way to improve the ionic conductivity of Na3PS4. The halogen dopants are thermodynamically favored to segregate at the grain boundaries, but the grain boundaries in a polycrystalline solid-state electrolyte are widely known to substantially reduce the ionic diffusion. The physical mechanism behind such effect and the role of the halogen dopants on the ionic diffusion are still not clear. In this study, density functional theory (DFT)-based MD simulations were applied to study the role of halogen doping on the ionic diffusion of Σ3 (112) and Σ5 (013) grain boundary structures of cubic Na3PS4. The results show that halogen doping has a different influence on the ionic diffusion of Σ3 (112) and Σ5 (013) structures, and it is governed by both the thermodynamic stability of the vacancy and the atomic environment around sodium ion hopping. This research will contribute to the future design of high-performance polycrystalline solid-state electrolytes by GB engineering.

中文翻译:

卤素掺杂对立方 Na3PS4 晶界结构中离子扩散的作用:从头算分子动力学研究

利用卤素掺杂引入Na空位是提高Na 3 PS 4离子电导率的有效途径。卤素掺杂剂在热力学上有利于在晶界处偏析,但众所周知,多晶固态电解质中的晶界会显着降低离子扩散。这种效应背后的物理机制以及卤素掺杂剂对离子扩散的作用仍不清楚。在这项研究中,应用基于密度泛函理论 (DFT) 的 MD 模拟来研究卤素掺杂对立方 Na 3 PS 4的 Σ3 (112) 和 Σ5 (013) 晶界结构的离子扩散的作用。. 结果表明,卤素掺杂对Σ3(112)和Σ5(013)结构的离子扩散有不同的影响,它受空位的热力学稳定性和钠离子跳跃周围的原子环境的影响。该研究将有助于GB工程未来设计高性能多晶固态电解质。
更新日期:2022-06-16
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