Abstract—

Tantalum oxide nanolayers of different thicknesses (30, 60, 90, and 120 nm) were deposited by physical evaporation on glass substrates at a deposition angle of 10° under high vacuum conditions at room temperature using an electron gun. There was no specific peak on the X-ray diffraction patterns because of amorphous nature of these layers. The results of atomic force microscopy showed that surface roughness reduced with increasing layer thickness. Field emission scanning electron microscopy images showed nucleation, growth, accession and integration as interconnected islands in the case of thinner layers and re-nucleation in the case of thicker ones (120 nm). Optical coefficients calculated using the Kramers–Kronig relations showed that with increasing layer thickness, dielectric properties, absorption coefficient, and band gap energy increased.

中文翻译：

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沉积角度对电子枪蒸发沉积氧化钽纳米层结构和光学性能的影响与厚度的关系

摘要——

使用电子枪在室温高真空条件下，通过物理蒸发在玻璃基板上以 10° 的沉积角沉积不同厚度（30、60、90 和 120 nm）的氧化钽纳米层。由于这些层的无定形性质，在 X 射线衍射图案上没有特定的峰。原子力显微镜的结果表明，表面粗糙度随着层厚的增加而降低。场发射扫描电子显微镜图像显示，在较薄层的情况下，成核、生长、加入和整合为相互连接的岛，而在较厚的层（120 nm）的情况下，再成核。使用 Kramers-Kronig 关系计算的光学系数表明，随着层厚度的增加，介电特性、吸收系数和带隙能量增加。