In the current study, a three-dimensional measurement of the magnetic flux density was performed for a 280 mm width × 250 mm thickness continuous casting bloom mold installed with electromagnetic stirring with varied current intensity and frequency. The magnetic flux density increased gradually to a peak value and then decreased along the downward vertical direction, and it decreased in the transverse direction from the copper plate to the center of the mold. The electromagnetic field in the mold and the stirrer was calculated, and the node loading method was used to model the current input. The effect of the mesh size on calculation accuracy was investigated, and it was found that the 0.02-m cell size for the mold and the 0.001-m cell size for the coil conductor and the iron core were enough to achieve good agreement between the calculation and measurement. It was revealed that the stainless metal shell of the stirrer and the molten steel flow had little influence on the magnetic flux density. The following empirical equation was obtained to calculate the local magnetic flux density along the vertical distance:

\(B = 0.0017 \times N \times I \times f^{ - 0.9} \exp \left( { - 0.022 + 0.064 \times \left( {\frac{{L - z_{{\text{o}}} }}{{L_{{\text{o}}} /2}}} \right) - 0.42 \times \left( {\frac{{L - z_{{\text{o}}} }}{{L_{{\text{o}}} /2}}} \right)^{2} } \right),\) where B is the local magnetic flux density in mT, I is the current intensity in A, f is the current frequency in s⁻¹, N is the number of turns of coils, L is the vertical distance away from the center of the stirrer in m, L_o is the height of the stirrer and was 0.35 m in the current study, and z_o is the distance of the stirrer center below the mold top and was 0.665 m in the current study.

在目前的研究中，对安装有电磁搅拌的 280 mm 宽 × 250 mm 厚的连铸大方坯结晶器进行了磁通密度的三维测量，该结晶器安装有不同电流强度和频率的电磁搅拌。磁通密度沿垂直向下逐渐增大至峰值后减小，从铜板到模具中心的横向减小。计算了模具和搅拌器中的电磁场，采用节点加载法对电流输入进行建模。研究了网格尺寸对计算精度的影响，发现模具的网格尺寸为 0.02 米，而 0. 线圈导体和铁芯的001-m单元尺寸足以在计算和测量之间实现良好的一致性。结果表明，搅拌器的不锈钢外壳和钢水流对磁通密度的影响很小。得到以下经验方程来计算沿垂直距离的局部磁通密度：

\(B = 0.0017 \times N \times I \times f^{ - 0.9} \exp \left( { - 0.022 + 0.064 \times \left( {\frac{{L - z_{{\text{o}} } }}{{L_{{\text{o}}} /2}}} \right) - 0.42 \times \left( {\frac{{L - z_{{\text{o}}} }}{ {L_{{\text{o}}} /2}}} \right)^{2} } \right),\)其中B是以 mT 为单位的局部磁通密度，I是以A为单位的电流强度，f是当前频率，以 s ^-1为单位，N是线圈的匝数，L是距搅拌器中心的垂直距离，以 m 为单位，L _o是搅拌器的高度，在当前研究中为 0.35 m，和z _o是模具顶部下方搅拌器中心的距离，在当前研究中为 0.665 m。