Fractal and multifractal are the most important processes and concepts in describing and examining surface morphology, and for this reason, these concepts are an important approach for analyzing the properties and surface geometry of thin films. In this article, multifractal analysis was performed on images, prepared using atomic force microscopy (AFM), of the surface morphology of nickel oxide thin films deposited by RF-Magnetron sputtering at different thicknesses on the glass substrate. The effect of thickness on the surface properties of the layers was studied by applying multifractal and statistical methods on AFM images. The results obtained from the multifractal spectrum show that the surface of the nickel oxide thin films deposited at different thicknesses are multifractal. The multifractal analysis demonstrated that multifractality and complexity of the surface of nickel oxide thin films changes and decrease with thicknesses. We also used statistical parameters to better examine AFM images to study the effects of layers thickness on the deposited NiO thin films. The results indicated that the statistical parameters are a function of the layer's thickness of NiO thin films. Hence, the isotropic properties and functional parameters changed with changing surface thickness.

中文翻译：

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射频磁控溅射不同厚度 NiO 薄膜的表面表征：统计和多重分形方法

分形和多重分形是描述和检查表面形态的最重要的过程和概念，因此，这些概念是分析薄膜性质和表面几何形状的重要方法。在本文中，对使用原子力显微镜 (AFM) 制备的图像进行了多重分形分析，对通过射频磁控溅射在玻璃基板上以不同厚度沉积的氧化镍薄膜的表面形态进行了分析。通过在 AFM 图像上应用多重分形和统计方法研究了厚度对层表面性质的影响。多重分形光谱结果表明，不同厚度的氧化镍薄膜表面呈多重分形。多重分形分析表明，氧化镍薄膜表面的多重分形性和复杂性随着厚度的增加而变化和降低。我们还使用统计参数来更好地检查 AFM 图像，以研究层厚度对沉积的 NiO 薄膜的影响。结果表明，统计参数是NiO薄膜层厚度的函数。因此，各向同性特性和功能参数随着表面厚度的变化而变化。