ABSTRACT

Diamond has high wear resistance and shape stability, and poly-crystalline chemical vapour deposition (CVD) diamond is difficult to mechanically process because of cleavage and wear anisotropy. On the other hand, diamond can be removed under an oxidising atmosphere with O₂ as the etching gas by reactive ion etching which is processing using plasma. In this study, the fabrication of an inward radio frequency (RF) plasma apparatus and the possibility of a removal process for carbon materials such as CVD diamond film and graphite plate by using it were investigated. OES, confocal laser scanning microscope and Raman spectroscopy were used for the evaluation of the etching. It was confirmed that the inward RF plasma apparatus fabricated could be applied to plasma etching for carbon materials. In addition, it was suggested that carbon materials were etched as CO with O₂ in the atmosphere, and amorphous structures were etched preferentially over crystalline ones.

摘要

金刚石具有很高的耐磨性和形状稳定性，而多晶化学气相沉积（CVD）金刚石由于解理和磨损各向异性而难以进行机械加工。另一方面，金刚石可以在氧化气氛下用 O _2去除。作为使用等离子体处理的反应离子蚀刻的蚀刻气体。在这项研究中，研究了向内射频 (RF) 等离子体装置的制造以及使用它去除 CVD 金刚石膜和石墨板等碳材料的可能性。OES、共聚焦激光扫描显微镜和拉曼光谱用于评估蚀刻。证实所制造的内向射频等离子装置可应用于碳材料的等离子刻蚀。此外，有人建议碳材料在大气中被蚀刻为 CO 与 O ₂，​​并且非晶结构优先于结晶结构被蚀刻。