Optimal Design of Surface Relief Grating for High-Resolution Two-Photon Interference Lithography,Advanced Theory and Simulations

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Optimal Design of Surface Relief Grating for High-Resolution Two-Photon Interference Lithography
Advanced Theory and Simulations ( IF 2.9 ) Pub Date : 2022-03-31 , DOI: 10.1002/adts.202200080
Jinseong Ahn ₁ , Junyong Park ₁

Affiliation

Two-photon interference lithography with an elastomeric phase grating that allows spontaneous conformal contact to the photoresist can be used to fabricate practical-scale, 3D photonic crystals through a single exposure. In principle, the unit cell symmetry and fill factor of the 3D periodic nanostructures produced using this technique are strongly depend on the structural parameters of the phase grating. However, theoretical approaches to derive the optimal parameters of the phase grating for realizing high-definition 3D nanostructures are still lacking. Here, the change in the Talbot interference pattern is systematically predicted with the relief height of the phase grating under the conditions in which two-photon interference lithography is performed through optical simulations. The collective set of results reveals the design error of the relief height of the phase grating, as inferred by the scalar approximation thus far, and presents the optimal condition that satisfies the π-phase shift inferred by the full-vectorial numerical solution.

中文翻译：

高分辨率双光子干涉光刻表面浮雕光栅的优化设计

具有弹性相位光栅的双光子干涉光刻技术允许与光刻胶自发共形接触，可用于通过单次曝光制造实用规模的 3D 光子晶体。原则上，使用该技术产生的 3D 周期性纳米结构的晶胞对称性和填充因子在很大程度上取决于相位光栅的结构参数。然而，仍然缺乏获得用于实现高清 3D 纳米结构的相位光栅最佳参数的理论方法。在这里，在通过光学模拟进行双光子干涉光刻的条件下，利用相位光栅的浮雕高度系统地预测了 Talbot 干涉图案的变化。

更新日期：2022-03-31

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