Rational design of noble metal catalysts with the potential to leverage efficiency is vital for industrial applications. Such an ultimate atom-utilization efficiency can be achieved when all noble metal atoms exclusively contribute to catalysis. Here, we demonstrate the fabrication of a wafer-size amorphous PtSe_x film on a SiO₂ substate via a low-temperature amorphization strategy, which offers single-atom-layer Pt catalysts with high atom-utilization efficiency (~26 wt%). This amorphous PtSe_x (1.2 < x < 1.3) behaves as a fully activated surface, accessible to catalytic reactions, and features a nearly 100% current density relative to a pure Pt surface and reliable production of sustained high-flux hydrogen over a 2 inch wafer as a proof-of-concept. Furthermore, an electrolyser is demonstrated to generate a high current density of 1,000 mA cm⁻². Such an amorphization strategy is potentially extendable to other noble metals, including the Pd, Ir, Os, Rh and Ru elements, demonstrating the universality of single-atom-layer catalysts.

具有利用效率潜力的贵金属催化剂的合理设计对于工业应用至关重要。当所有贵金属原子都专门用于催化时，可以实现这种最终的原子利用效率。在这里，我们展示了通过低温非晶化策略在 SiO ₂亚态上制造晶片尺寸的非晶 PtSe _{x薄膜，该策略提供了具有高原子利用效率（~26 wt%）的单原子层 Pt 催化剂。}这种无定形 PtSe _x (1.2 <  x < 1.3) 表现为完全活化的表面，可进行催化反应，并具有相对于纯 Pt 表面接近 100% 的电流密度，以及在 2 英寸晶片上可靠地生产持续的高通量氢气作为概念验证. 此外，电解槽被证明可以产生 1,000 mA cm ^-2的高电流密度。这种非晶化策略有可能扩展到其他贵金属，包括 Pd、Ir、Os、Rh 和 Ru 元素，证明了单原子层催化剂的普遍性。