Controllable deposition sites in galvanic replacement (GR) are crucial for the application performance of noble metal nanoparticles (NMNPs). However, the simplicity and effectiveness of the existing research methods for controlling GR deposition sites are still needed to be improved. Herein, a novel method is proposed to simply and effectively control the deposition sites of NMNPs (Au and Pt) in the GR reaction by shaped femtosecond laser surface pre-modification. First, the localized free electron density of silicon is regulated by spatially shaped femtosecond laser to efficiently produce large-area uniform periodic amorphous transformation, which periodically changes the chemical reducibility of silicon. Second, this difference in chemical reducibility guides the subsequent GR reaction to produce large-area NMNPs with controllable deposition sites. By controlling the distribution and density of particles, these controllable NMNPs exhibit a superior SERS performance to the particles prepared by GR reaction alone: the maximum EF is 8.46 × 10⁷ with high signal uniformity (RSD < 9.7%) and superior chemical stability (4.8% intensity deviation after 2 months in the air), which indicated the advantages of NMNPs with controllable deposition sites. This study provides a facile method to control the GR deposition sites and a new idea for Raman-enhanced substrate preparation.

电置换 (GR) 中的可控沉积位点对于贵金属纳米粒子 (NMNP) 的应用性能至关重要。然而，现有控制GR沉积位点的研究方法的简单性和有效性仍有待提高。在此，提出了一种通过成形飞秒激光表面预改性简单有效地控制 GR 反应中 NMNPs（Au 和 Pt）沉积位点的新方法。首先，硅的局域自由电子密度通过空间成形的飞秒激光进行调节，以有效地产生大面积均匀周期性非晶转变，从而周期性地改变硅的化学还原性。第二，这种化学还原性的差异指导随后的 GR 反应产生具有可控沉积位点的大面积 NMNP。通过控制粒子的分布和密度，这些可控的 NMNPs 表现出优于单独通过 GR 反应制备的粒子的 SERS 性能：最大 EF 为 8.46 × 10⁷具有高信号均匀性（RSD < 9.7%）和优异的化学稳定性（在空气中 2 个月后强度偏差为 4.8%），这表明 NMNP 具有可控沉积位点的优势。该研究为控制 GR 沉积位点提供了一种简便的方法，并为拉曼增强基板制备提供了新思路。