In this study, the electro-optical properties of a flexible electrochromic device (ECD) with WO₃ film were investigated according to the pressure of Ar gas during RF magnetron sputtering process. The ECD was fabricated using WO₃ film as the cathode electrode and NiO as the anode electrode. Both electrodes were deposited using RF magnetron sputtering over indium tin oxide coated on polyethylene terephthalate film (PET/ITO). The electrolyte for the ECD used the lithium percolate mixed with poly methyl methacrylate and propylene carbonate to form the gel type electrolyte. The sputtering time was controlled while measuring with a thickness/rate monitor (Sycon STM-100) to have the identical WO₃ film thickness at different Ar pressures. Also, argon working gas pressure in sputtering chamber was varied at 5 mTorr, 10 mTorr, and 15mTorr, respectively. The deposition rate of WO₃ film was 14 nm/min for Ar gas pressure 5 mTorr then after the pressure was increased until 15 mTorr the deposition rate was 8.6 nm/min. The sputtering process was operated until the thickness of the WO₃ film reach 250 nm. In order to investigate electro-optical properties of the ECD, such as coloration efficiency (CE), transmittance of bleached state (Tb), transmittance of coloured state (Tc), optical modulation, bleaching time, and coloration time were analyzed. The ECD with Ar pressure at 5 m Torr for WO₃ film shows the coloration efficiency was 57.58 cm²C^-1, Tb was 17%, Tc was 5%. Also, the bleaching time was 15 s, and coloration time was 30 s. When the sputtering pressure was increased to 15 mTorr, the ECD showed the better optical properties but the bleaching time and coloration time was rise to 50 s, and 58 s, respectively. The ECD at 15mTorr show the higher optical modulation of 55%.

在这项研究中，根据射频磁控溅射过程中的氩气压力，研究了具有 WO ₃薄膜的柔性电致变色器件 (ECD) 的电光特性。使用WO ₃膜作为阴极和NiO作为阳极来制造ECD 。两个电极均使用 RF 磁控管溅射沉积在涂覆在聚对苯二甲酸乙二醇酯膜 (PET/ITO) 上的氧化铟锡上。ECD 的电解质使用渗滤锂与聚甲基丙烯酸甲酯和碳酸亚丙酯混合形成凝胶型电解质。控制溅射时间，同时用厚度/速率监测器 (Sycon STM-100) 测量以获得相同的 WO ₃不同 Ar 压力下的薄膜厚度。此外，溅射室中的氩气工作气压分别为 5 mTorr、10 mTorr 和 15 mTorr。对于5毫托的Ar气压，WO ₃膜的沉积速率为14纳米/分钟，然后在压力增加至15毫托后，沉积速率为8.6纳米/分钟。溅射工艺一直进行到WO ₃薄膜的厚度达到250nm。为了研究 ECD 的电光特性，例如着色效率 (CE)、漂白状态的透射率 (Tb)、着色状态的透射率 (Tc)、光学调制、漂白时间和着色时间。对于 WO ₃薄膜，Ar 压力为 5 m Torr 的 ECD显示着色效率为 57.58 cm ²C ^-1，Tb为17%，Tc为5%。此外，漂白时间为 15 秒，着色时间为 30 秒。当溅射压力增加到 15 mTorr 时，ECD 显示出更好的光学性能，但漂白时间和着色时间分别增加到 50 s 和 58 s。15mTorr 下的 ECD 显示出 55% 的更高光调制。