Fabrication of High χ-Low N Block Copolymers with Thermally Stable Sub-5 nm Microdomains Using Polyzwitterion as a Constituent Block,ACS Macro Letters

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Fabrication of High χ-Low N Block Copolymers with Thermally Stable Sub-5 nm Microdomains Using Polyzwitterion as a Constituent Block
ACS Macro Letters ( IF 5.1 ) Pub Date : 2021-10-06 , DOI: 10.1021/acsmacrolett.1c00461
Shi-Peng Ding ₁ , Ze-Kun Zhang ₁ , Ze Ye ₁ , Bin-Yang Du ₁ , Jun-Ting Xu ₁

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In this work, we used zwitterionic poly(4-vinylpyridine) propane-1-sulfonate (PVPS) as a constituent block to construct high χ-low N block copolymers (BCPs) with different neutral polymers as the other block, including polystyrene (PS), poly(ethylene oxide) (PEO), and poly(l-lactide) (PLLA). Lamellar structures with sub-5 nm microdomains were observed in all three types of BCPs. Due to the tendency of self-aggregation induced by electrostatic interaction in polyzwitterion, the Flory–Huggins parameters (χ) between PVPS and most neutral polymers are relatively high, which provides a facile and efficient way to fabricate high χ-low N BCPs. In addition, the dimension of the sub-5 nm structures formed in PVPS-containing BCPs showed high thermal stability with a small fluctuation (±0.1 nm) of domain spacings upon heating.

中文翻译：

使用多两性离子作为组成嵌段制备具有热稳定的亚 5 nm 微区的高 χ-低 N 嵌段共聚物

在这项工作中，我们使用两性离子聚 (4-乙烯基吡啶) 丙烷-1-磺酸盐 (PVPS) 作为组成嵌段，以构建高 χ- 低N嵌段共聚物 (BCP)，其中不同的中性聚合物作为其他嵌段，包括聚苯乙烯 (PS )、聚 (环氧乙烷) (PEO) 和聚 ( l-丙交酯) (PLLA)。在所有三种类型的 BCP 中均观察到具有亚 5 nm 微区的层状结构。由于多两性离子中静电相互作用引起的自聚集趋势，PVPS 与大多数中性聚合物之间的 Flory-Huggins 参数 (χ) 相对较高，这为制造高 χ-低N提供了一种简便有效的方法BCP。此外，在含有 PVPS 的 BCP 中形成的亚 5 nm 结构的尺寸显示出高热稳定性，加热时域间距的波动很小（±0.1 nm）。

更新日期：2021-10-19

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