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Mitigating the Kinetic Hindrance of Single-Crystalline Ni-Rich Cathode via Surface Gradient Penetration of Tantalum
Angewandte Chemie International Edition ( IF 16.1 ) Pub Date : 2021-10-03 , DOI: 10.1002/anie.202111954 Yu-Gang Zou 1, 2 , Huican Mao 3 , Xin-Hai Meng 1, 2 , Ya-Hao Du 1 , Hang Sheng 1, 2 , Xiqian Yu 4 , Ji-Lei Shi 1, 2 , Yu-Guo Guo 1, 2
Angewandte Chemie International Edition ( IF 16.1 ) Pub Date : 2021-10-03 , DOI: 10.1002/anie.202111954 Yu-Gang Zou 1, 2 , Huican Mao 3 , Xin-Hai Meng 1, 2 , Ya-Hao Du 1 , Hang Sheng 1, 2 , Xiqian Yu 4 , Ji-Lei Shi 1, 2 , Yu-Guo Guo 1, 2
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The Ta doping created some low-valence Ni, decreasing the electrostatic repulsion between transition metal and Li+, thus the Li+ diffusion energy barrier has been decreased and the kinetic hindrance was mitigated.
中文翻译：
通过钽的表面梯度渗透减轻单晶富镍阴极的动力学障碍
Ta掺杂产生了一些低价Ni，降低了过渡金属和Li +之间的静电排斥，从而降低了Li +扩散能垒并减轻了动力学障碍。
更新日期：2021-12-06
中文翻译：
通过钽的表面梯度渗透减轻单晶富镍阴极的动力学障碍
Ta掺杂产生了一些低价Ni，降低了过渡金属和Li +之间的静电排斥，从而降低了Li +扩散能垒并减轻了动力学障碍。
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