Optical loss is a significant factor restricting the conversion efficiency of conventional bifacial tunnel oxide passivating contact (TOPCon) solar cells. Black silicon structure is commonly used to enhance the photogenerated current density (J_ph) of crystalline solar cells due to its excellent light-trapping capability. However, the photogenerated current gain is cancelled by the increased emitter recombination current originated from the black silicon structure with a high enhanced surface area ratio. In this work, we used a buffered oxide etching solution to modify the surface morphology of nanopore/micron-pyramid composite (NPP) structure silicon. Further, we studied the effects of NPP structures with different enhanced surface area ratio on front-side reflection, boron atom doping, emitter passivation, and cell performance. By identifying the appropriate surface modification processing, we fabricated the large-scale (158.75 mm × 158.75 mm) bifacial TOPCon solar cells using industrial equipment and processes with an average short-circuit current density of 41.12 mA/cm² and average conversion efficiency of 23.08%. Through adequately widening nanostructure size and depositing high-quality Al₂O₃/SiN_x stacked passivation films on NPP structure surface, we achieved lower carrier recombination while maintaining high J_ph.

光损耗是限制传统双面隧道氧化物钝化接触 (TOPCon) 太阳能电池转换效率的重要因素。黑硅结构通常用于增强光生电流密度（J _ph) 晶体太阳能电池由于其出色的光捕获能力。然而，光生电流增益被源自具有高增强表面积比的黑硅结构增加的发射极复合电流所抵消。在这项工作中，我们使用缓冲氧化物蚀刻溶液来修改纳米孔/微米金字塔复合材料 (NPP) 结构硅的表面形态。此外，我们研究了具有不同增强表面积比的 NPP 结构对正面反射、硼原子掺杂、发射极钝化和电池性能的影响。通过确定合适的表面改性工艺，我们使用工业设备和工艺制造了大规模（158.75 mm × 158.75 mm）双面 TOPCon 太阳能电池，平均短路电流密度为 41.12 mA/cm²平均转换效率为 23.08%。通过充分加宽纳米结构尺寸并在 NPP 结构表面沉积高质量的 Al ₂ O ₃ /SiN _x堆叠钝化膜，我们在保持高J _{ph 的}同时实现了较低的载流子复合。