This paper addresses issues related to cracking and blisters in deposited films encountered in a lift-off process with electron beam evaporation and a bilayer PMMA resist system. The impact of charged particles, i.e., electrons and ions, is investigated using an electron beam evaporation chamber equipped with ring-magnets and a plate electrode placed in front of the sample. By replacing the plate electrode with a hollow metallic cylinder, the modified evaporation setup utilizing passive components allows complete elimination of resist shrinkage and bubble formation yielding near perfect deposition results for a large variety of different materials.

中文翻译：

---

电子和离子辐照在使用电子束蒸发和双层 PMMA 抗蚀剂系统的可靠剥离工艺中的作用

本文解决了在使用电子束蒸发和双层 PMMA 抗蚀剂系统的剥离工艺中遇到的与沉积膜中的开裂和起泡相关的问题。带电粒子（即电子和离子）的影响使用配备环形磁铁和放置在样品前面的板电极的电子束蒸发室进行研究。通过用空心金属圆柱体代替板电极，改进的蒸发装置利用无源元件可以完全消除抗蚀剂收缩和气泡形成，为各种不同的材料产生近乎完美的沉积结果。