Combining microstructures of different dimensions benefits from hybrid manufacturing strategies that use nanoimprint for generating regular large area structures and laser lithography for larger grayscale topography. While the individual processes are straightforward, due to the thermoplastic property of the positive resist used for grayscale lithography, diffraction on surface gratings and degradation of photoactive substances require a careful choice of the order of process steps, and balance of process, temperatures, and dimensions.

中文翻译：

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直接写入光刻的混合结构——用纳米压印调整灰度光刻胶的对比度和表面形貌

结合不同尺寸的微结构受益于混合制造策略，该策略使用纳米压印生成规则的大面积结构和激光光刻以生成更大的灰度地形。虽然各个过程很简单，但由于用于灰度光刻的正性抗蚀剂的热塑性，表面光栅上的衍射和光活性物质的降解需要仔细选择工艺步骤的顺序，以及工艺、温度和尺寸的平衡.