In 8- to 20-keV photon energy region, ruthenium and carbon thin films are used in multilayer monochromators. In the present study, this material combination is explored for X-ray waveguide applications in hard X-ray region. The structural parameters (thickness of each layer) of Ru/C/Ru waveguide structure are optimized to get maximum intensity enhancement of fundamental mode inside carbon guiding layer. A sample with optimized structural parameters is deposited using ion beam sputtering (IBS) technique and characterized using X-ray reflectivity (XRR) and grazing incidence X-ray fluorescence (GIXRF) techniques. The analysis suggests that the density of bottom Ru layer and carbon guiding layer is close to bulk density (~97% for Ru and ~95% for carbon), whereas density of top Ru layer is slightly lower (~93% of bulk density). A ~10% of thickness variation in top cladding layer along with marginal change in layer density deteriorate field enhancement in TE₀ mode by more than three times. Effect of thickness and density variation on waveguide (Ru [7 nm]/C [18 nm]/Ru [20 nm]) performance is discussed.

中文翻译：

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使用掠入射 X 射线反射率和 X 射线荧光对 Ru/C/Ru 三层结构的表面和界面表征

在 8 到 20 keV 的光子能量范围内，钌和碳薄膜用于多层单色器。在本研究中，探索了这种材料组合在硬 X 射线区域的 X 射线波导应用。优化Ru/C/Ru波导结构的结构参数（每层厚度）以获得碳引导层内基模的最大强度增强。使用离子束溅射 (IBS) 技术沉积具有优化结构参数的样品，并使用 X 射线反射率 (XRR) 和掠入射 X 射线荧光 (GIXRF) 技术进行表征。分析表明，底部 Ru 层和碳引导层的密度接近体积密度（Ru 为~97%，碳为~95%），而顶部 Ru 层的密度略低（体积密度的~93%） .₀模式超过 3 倍。讨论了厚度和密度变化对波导 (Ru [7 nm]/C [18 nm]/Ru [20 nm]) 性能的影响。