Laser texturing of cutting tool is a promising surface modification method for improving the machinability and form accuracy of the machined workpieces in the precision machining of difficult-to-machine material. However, the blocking of micro-textures by the cutting chips, i.e., derivative cutting, usually occurs because of the severe friction between the tool and chip, which can hinder the effectiveness of micro-textures prepared on the rake face of the cutting tool. To address this issue, an external magnetic field was superimposed on the micro-textured tools in order to promote the infiltration of magnetic nanofluid into the micro-textured tool-chip interface, and the possible mechanisms for the effect of magnetic field on the inhibition of derivative cutting caused by the micro-textures was for the first time revealed in this research. Herein, the cutting of 316 L stainless steel with the micro-textured tools was performed under the magnetic field, and the effect of different parameters of magnetic fields on the machining characteristic of micro-textured tools (TT) under Fe₃O₄ nanofluid (MNF) lubrication condition was investigated. The results reveal that the MNF could be effectively migrated into the micro-textured tool-chip interface in presence of the external magnetic field, and consequently the degree of derivative cutting caused by the micro-textured tools was effectively suppressed. Thus, the machining characteristic of TT tools was gradually improved with increasing the magnetic field strength from 300 to 1200 Gs. Besides, infiltration mechanism of MNF at the micro-textured tool-chip interface under different parameters of magnetic fields were discussed.

在难加工材料的精密加工中，刀具激光纹理化是一种很有前景的表面改性方法，可提高被加工工件的可加工性和形状精度。然而，切削屑对微纹理的阻塞，即衍生切削，通常是由于刀具与切屑之间的摩擦剧烈而发生的，这会阻碍在刀具前刀面上制备的微纹理的有效性。为了解决这个问题，在微纹理工具上叠加外部磁场以促进磁性纳米流体渗透到微纹理工具 - 芯片界面，以及磁场影响抑制的可能机制本研究首次揭示了由微纹理引起的衍生切割。在此处，_{研究了 3} O ₄纳米流体 (MNF) 润滑条件。结果表明，在外部磁场存在的情况下，MNF可以有效地迁移到微织构刀具-切屑界面，从而有效抑制微织构刀具引起的衍生切削程度。因此，随着磁场强度从 300 Gs 增加到 1200 Gs，TT 刀具的加工特性逐渐改善。此外，讨论了不同磁场参数下MNF在微纹理工具-芯片界面处的浸润机制。