Crystalline-oriented thick films have been fabricated with using plasma-synthesized (0–20.0 at.%) Nb-doped TiO₂ powder by slip casting method in a strong magnetic field (12 T). Degree of c-axis orientation of the fabricated thick film was evaluated by Lotgering factor (f). The orientation degree along c-axis was improved by sintering at 600 °C, but was deteriorated at 700 °C. Photocatalytic performance under the UV light irradiation was conducted on the film surface and was determined by bleaching methyl orange aqueous solution. The improvement in the photocatalytic performance was greatly attributed to the dominated crystalline-orientation of the (0 0 1) plane for the Nb-doped TiO₂.

在强磁场 (12 T) 中，使用等离子合成 (0–20.0 at.%) Nb 掺杂的 TiO ₂粉末通过滑铸法制备了晶体取向的厚膜。制造的厚膜的 c 轴取向度通过 Lotgering 因子 (f) 进行评估。沿 c 轴的取向度通过在 600 °C 下烧结得到改善，但在 700 °C 时劣化。在紫外光照射下对薄膜表面进行光催化性能，并通过漂白甲基橙水溶液来测定。光催化性能的提高很大程度上归因于Nb 掺杂的 TiO ₂的（0  0  1）面的主导晶体取向。