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Effects of free carriers on the optical properties of high mobility transition metal dopedIn2O3transparent conductors
Physical Review Materials ( IF 3.1 ) Pub Date : 2021-09-17 , DOI: 10.1103/physrevmaterials.5.094603
Kingsley O. Egbo 1 , Ayotunde E. Adesina 2 , Chioma V. Ezeh 1 , Chao Ping Liu 3 , Kin Man Yu 1, 2
Affiliation  

Transition metal doped In2O3 with high mobility can be used as a transparent conductor with enhanced transparency spectral window. In this work, we carried out a comprehensive study on the electrical and optical properties of In2O3 doped with several transition metal (TM) species (In2O3:TM) including W, Zr, Mo, and Ti. Detailed optical properties obtained by spectroscopic ellipsometry (SE) are correlated with electrical properties obtained by Hall effect measurements. We find that the mobility of In2O3:TM thin films lies in the range of 5075cm2V1s1, much higher than the typical mobility of 3040cm2V1s1 for conventional ITO. The complex dielectric functions of the thin films reveal remarkable carrier density dependent changes in the optical properties. SE analyses show that the electron effective mass of In2O3:TM at the bottom of the conduction band mo* (0.110.14mo) is much smaller than the reported mo*0.180.30mo for ITO, which directly results in their higher mobility. This low mo* is consistent with recent theoretical studies which proposed that 4d donor states of the TMs are resonance in the CB. For films with comparably low resistivity of 12×104Ωcm, we find that In2O3:TM films have ∼4–10 times lower absorption coefficient at λ=1300nm due to free carrier absorption and have their plasma reflection edge extended to ∼1.7 μm compared to ∼1.2–1.4 μm for ITO. Hence, using TM doping we have achieved transparent conductors with conductivity comparable to ITO but with transmission extended to >1600 nm. These materials will be potentially important as transparent conductors for optoelectronic devices utilizing NIR photons.

中文翻译:

自由载流子对高迁移率过渡金属掺杂In2O3透明导体光学性能的影响

过渡金属掺杂 23具有高迁移率可用作具有增强透明光谱窗口的透明导体。在这项工作中,我们对电学和光学特性进行了全面的研究。23 掺杂了几种过渡金属(TM)物种(23TM值) 包括 W、Zr、Mo 和 Ti。通过光谱椭偏法 (SE) 获得的详细光学特性与通过霍尔效应测量获得的电特性相关。我们发现流动性23TM值 薄膜范围为 50——75C2-1-1,远高于典型的流动性 30——40C2-1-1用于传统 ITO。薄膜的复杂介电功能揭示了光学特性中显着的载流子密度依赖性变化。SE 分析表明电子有效质量为23TM值 在导带底部 * (0.11——0.14) 远小于报告的 *0.18-0.30ITO,这直接导致其更高的流动性。这个低* 与最近提出的理论研究一致 4dTM 的供体状态在 CB 中是共振的。对于电阻率相对较低的薄膜1——2×10-4Ω厘米,我们发现 23TM值 薄膜的吸收系数低约 4-10 倍 λ=1300纳米由于自由载流子吸收,并且与 ITO 的约 1.2-1.4 μm 相比,它们的等离子体反射边缘扩展到约 1.7 μm。因此,使用 TM 掺杂,我们获得了导电率与 ITO 相当但传输扩展到 >1600 nm 的透明导体。这些材料作为利用 NIR 光子的光电器件的透明导体具有潜在的重要意义。
更新日期:2021-09-17
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