This study systematically revealed the feasibility of the sequential ClO₂-UV/chlorine process for micropollutant removal and disinfection byproduct (DBP) control. The results demonstrated that the sequential ClO₂-UV/chlorine process was effective for the removal of 12 micropollutants. ClO₂ pre-treatment reduced the formation of disinfect byproducts (DBPs) in the UV/chlorine process. Compared to the UV/chlorine process, ClO₂ pre-treatment (1.0 mg L⁻¹) decreased the formation of the 6 DBPs by 25.1–72.2%; and decreased the formation potential of the 6 DBPs by 13.9–51.8%. Moreover, ClO₂ pre-treatment reduced the concentration of total organic chlorine by 19.8%. ClO₂ pre-treatment affected the UV/chlorine process in different ways. Firstly, ClO₂ pre-treatment generated chlorite, which dominantly served as a scavenger of chlorine radical (Cl) and hydroxyl radical (HO). Secondly, ClO₂ pre-treatment decreased the reactivity of natural organic matter (NOM) towards radicals. Finally, ClO₂ pre-treatment altered the properties of NOM, in terms of reducing the electron-donating capacity and aromaticity of NOM (SUVA₂₅₄), and slightly reducing the average molecular weight of NOM. Overall, ClO₂ pre-treatment effectively controlled the formation of DBPs in the UV/chlorine process. This study confirmed the sequential ClO₂-UV/chlorine process was an alternative strategy to balancing the micropollutant removal and DBP control.

该研究系统地揭示了连续 ClO ₂ -UV/氯工艺用于微污染物去除和消毒副产物 (DBP) 控制的可行性。结果表明，连续的 ClO ₂ -UV/氯工艺可有效去除 12 种微污染物。ClO ₂预处理减少了紫外线/氯过程中消毒副产物 (DBP) 的形成。与 UV/氯工艺相比，ClO ₂预处理（1.0 mg L ^-1）使 6 DBPs 的形成减少了 25.1–72.2%；并使 6 种 DBP 的形成潜力降低了 13.9-51.8%。此外，ClO ₂预处理使总有机氯浓度降低了19.8%。CLO ₂预处理以不同的方式影响紫外线/氯工艺。首先，ClO ₂预处理产生亚氯酸盐，其主要充当氯自由基（Cl ）和羟基自由基（HO ）的清除剂。其次，ClO ₂预处理降低了天然有机物（NOM）对自由基的反应性。最后，ClO ₂预处理改变了 NOM 的性质，降低了 NOM (SUVA ₂₅₄ )的给电子能力和芳香性，并略微降低了 NOM 的平均分子量。总体而言，ClO ₂预处理有效地控制了UV/氯工艺中DBPs的形成。该研究证实了连续的 ClO ₂- 紫外线/氯工艺是平衡微污染物去除和 DBP 控制的替代策略。